Inventor
WU HENGPENG
US32 patents
⚠️ This page may combine multiple inventors who share the name “WU HENGPENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AZ ELECTRONIC MATERIALS USA
11 patentsUS7824837B2Nov 2, 2010
Positive-working photoimageable bottom antireflective coating
AZ ELECTRONIC MATERIALS USA54 citations95
US7638262B2Dec 29, 2009
Antireflective composition for photoresists
AZ ELECTRONIC MATERIALS USA19 citations92
US7691556B2Apr 6, 2010
Antireflective compositions for photoresists
AZ ELECTRONIC MATERIALS USA29 citations91
US7264913B2Sep 4, 2007
Antireflective compositions for photoresists
AZ ELECTRONIC MATERIALS USA21 citations89
US7081511B2Jul 25, 2006
Process for making polyesters
AZ ELECTRONIC MATERIALS USA21 citations87
US8039202B2Oct 18, 2011
Positive-working photoimageable bottom antireflective coating
AZ ELECTRONIC MATERIALS USA11 citations81
US7030201B2Apr 18, 2006
Bottom antireflective coatings
AZ ELECTRONIC MATERIALS USA7 citations72
US7008476B2Mar 7, 2006
Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof
AZ ELECTRONIC MATERIALS USA7 citations70
US8026040B2Sep 27, 2011
Silicone coating composition
AZ ELECTRONIC MATERIALS USA5 citations61
US7666575B2Feb 23, 2010
Antireflective coating compositions
AZ ELECTRONIC MATERIALS USA1 citations51
US7824844B2Nov 2, 2010
Solvent mixtures for antireflective coating compositions for photoresists
AZ ELECTRONIC MATERIALS USA0 citations49
WU HENGPENG
6 patentsUS8691925B2Apr 8, 2014
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
WU HENGPENG30 citations91
US9093263B2Jul 28, 2015
Underlayer composition for promoting self assembly and method of making and using
WU HENGPENG8 citations83
US9052598B2Jun 9, 2015
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
WU HENGPENG6 citations83
US8835581B2Sep 16, 2014
Neutral layer polymer composition for directed self assembly and processes thereof
WU HENGPENG16 citations82
US9291909B2Mar 22, 2016
Composition comprising a polymeric thermal acid generator and processes thereof
WU HENGPENG3 citations71
US8852848B2Oct 7, 2014
Composition for coating over a photoresist pattern
WU HENGPENG3 citations59
MERCK PATENT GMBH
4 patentsUS11366392B2Jun 21, 2022
Photoresist remover compositions
MERCK PATENT GMBH0 citations62
US11168288B2Nov 9, 2021
Photoresist remover compositions
MERCK PATENT GMBH0 citations62
US11994803B2May 28, 2024
Photoresist remover compositions
MERCK PATENT GMBH0 citations54
US11365379B2Jun 21, 2022
Photoresist remover compositions
MERCK PATENT GMBH0 citations46