Inventor
GATES STEPHEN M
US87 patents
⚠️ This page may combine multiple inventors who share the name “GATES STEPHEN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
40 patentsUS7088003B2Aug 8, 2006
Structures and methods for integration of ultralow-k dielectrics with improved reliability
IBM563 citations99
US7045453B2May 16, 2006
Very low effective dielectric constant interconnect structures and methods for fabricating the same
IBM221 citations99
US6391658B1May 21, 2002
Formation of arrays of microelectronic elements
IBM257 citations99
US6162532ADec 19, 2000
Magnetic storage medium formed of nanoparticles
IBM190 citations99
US9349687B1May 24, 2016
Advanced manganese/manganese nitride cap/etch mask for air gap formation scheme in nanocopper low-K interconnect
IBM96 citations98
US9305836B1Apr 5, 2016
Air gap semiconductor structure with selective cap bilayer
IBM488 citations98
US7282458B2Oct 16, 2007
Low K and ultra low K SiCOH dielectric films and methods to form the same
IBM97 citations98
US7049247B2May 23, 2006
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
IBM558 citations98
US7030468B2Apr 18, 2006
Low k and ultra low k SiCOH dielectric films and methods to form the same
IBM71 citations98
US7023093B2Apr 4, 2006
Very low effective dielectric constant interconnect Structures and methods for fabricating the same
IBM112 citations98
US6911400B2Jun 28, 2005
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
IBM79 citations98
US6617690B1Sep 9, 2003
Interconnect structures containing stress adjustment cap layer
IBM79 citations98
US6641899B1Nov 4, 2003
Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same
IBM43 citations96
US6917108B2Jul 12, 2005
Reliable low-k interconnect structure with hybrid dielectric
IBM49 citations95
US7253105B2Aug 7, 2007
Reliable BEOL integration process with direct CMP of porous SiCOH dielectric
IBM26 citations93
US6989575B2Jan 24, 2006
Formation of arrays of microelectronic elements
IBM21 citations93
US6803660B1Oct 12, 2004
Patterning layers comprised of spin-on ceramic films
IBM19 citations93
US7479306B2Jan 20, 2009
SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same
IBM26 citations92
US6265021B1Jul 24, 2001
Nanoparticle structures utilizing synthetic DNA lattices
IBM30 citations92
US7312524B2Dec 25, 2007
Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
IBM23 citations91
US7135398B2Nov 14, 2006
Reliable low-k interconnect structure with hybrid dielectric
IBM18 citations91
US6939797B2Sep 6, 2005
Advanced BEOL interconnect structures with low-k PE CVD cap layer and method thereof
IBM26 citations91
US6737747B2May 18, 2004
Advanced BEOL interconnect structures with low-k PE CVD cap layer and method thereof
IBM43 citations91
US6734096B2May 11, 2004
Fine-pitch device lithography using a sacrificial hardmask
IBM22 citations91
US9786550B2Oct 10, 2017
Low resistance metal contacts to interconnects
IBM8 citations84
US8658488B2Feb 25, 2014
Method for forming semiconductor chip with graphene based devices in an interconnect structure of the chip
IBM6 citations84
US7915180B2Mar 29, 2011
SiCOH film preparation using precursors with built-in porogen functionality
IBM8 citations84
US7892648B2Feb 22, 2011
SiCOH dielectric material with improved toughness and improved Si-C bonding
IBM8 citations84
US7674521B2Mar 9, 2010
Materials containing voids with void size controlled on the nanometer scale
IBM9 citations84
US7521377B2Apr 21, 2009
SiCOH film preparation using precursors with built-in porogen functionality
IBM11 citations84
US7335980B2Feb 26, 2008
Hardmask for reliability of silicon based dielectrics
IBM12 citations84
US9711455B2Jul 18, 2017
Method of forming an air gap semiconductor structure with selective cap bilayer
IBM5 citations83
US7948051B2May 24, 2011
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
IBM4 citations74
US7517790B2Apr 14, 2009
Method and structure to enhance temperature/humidity/bias performance of semiconductor devices by surface modification
IBM7 citations74
US6929982B2Aug 16, 2005
Patterning layers comprised of spin-on ceramic films
IBM7 citations74
US6897650B2May 24, 2005
Magnetic-field sensor device
IBM10 citations74
US6673401B2Jan 6, 2004
Nanoparticle structures utilizing synthetic DNA lattices
IBM7 citations74
US9984940B1May 29, 2018
Selective and conformal passivation layer for 3D high-mobility channel devices
IBM6 citations73
US9799552B2Oct 24, 2017
Low resistance metal contacts to interconnects
IBM2 citations73
US9472710B1Oct 18, 2016
Low-loss large-grain optical waveguide for interconnecting components integrated on a glass substrate
IBM5 citations73
EDELSTEIN DANIEL C
3 patentsUS8525169B1Sep 3, 2013
Reliable physical unclonable function for device authentication
EDELSTEIN DANIEL C115 citations98
US8759976B2Jun 24, 2014
Structure with sub-lithographic random conductors as a physical unclonable function
EDELSTEIN DANIEL C18 citations84
US8101236B2Jan 24, 2012
Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding
EDELSTEIN DANIEL C8 citations84
(unassigned)
2 patentsGATES STEPHEN M
2 patentsSONSUB INC
1 patentDIMITRAKOPOULOS CHRISTOS D
1 patentKURSUN EREN
1 patentShowing the top 50 of 87 patents by PatentIndex Score.