Inventor
KIHARA NAOKO
JP45 patents
⚠️ This page may combine multiple inventors who share the name “KIHARA NAOKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
34 patentsUS6280897B1Aug 28, 2001
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
TOSHIBA KK80 citations96
US5332648AJul 26, 1994
Potosensitive composition and method of forming a pattern using the same
TOSHIBA KK79 citations94
US6197473B1Mar 6, 2001
Photosensitive composition and a pattern forming process using the same
TOSHIBA KK52 citations93
US5932391AAug 3, 1999
Resist for alkali development
TOSHIBA KK31 citations92
US5756254AMay 26, 1998
Resist, method of forming a resist pattern and manufacturing an electronic parts using the resist
TOSHIBA KK25 citations92
US5518864AMay 21, 1996
Method of forming polyimide film pattern
TOSHIBA KK31 citations92
US5348838ASep 20, 1994
Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group
TOSHIBA KK39 citations92
US5348835ASep 20, 1994
Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent
TOSHIBA KK33 citations92
US5340684AAug 23, 1994
Photosensitive composition and resin-encapsulated semiconductor device
TOSHIBA KK40 citations92
US5372914ADec 13, 1994
Pattern forming method
TOSHIBA KK29 citations91
US7931819B2Apr 26, 2011
Method for pattern formation
TOSHIBA KK9 citations84
US7343857B2Mar 18, 2008
Imprint apparatus and method for imprinting
TOSHIBA KK19 citations80
US6879099B2Apr 12, 2005
Organic EL element and organic EL display
TOSHIBA KK11 citations74
US6190841B1Feb 20, 2001
Pattern forming process and a photosensitive composition
TOSHIBA KK12 citations74
US5853952ADec 29, 1998
Color developing organic material, color developing resin composition and colored thin film pattern
TOSHIBA KK7 citations74
US9835947B2Dec 5, 2017
Self-organization material and pattern formation method
TOSHIBA KK5 citations72
US6340552B1Jan 22, 2002
Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
TOSHIBA KK6 citations72
US5216077AJun 1, 1993
Rubber-modified phenolic resin composition and method of manufacturing the same
TOSHIBA KK17 citations72
US4916174AApr 10, 1990
Rubber-modified phenolic resin composition and method of manufacturing the same
TOSHIBA KK17 citations72
US5068267ANov 26, 1991
Semiconductor device encapsulant consisting of epoxy resin composition
TOSHIBA KK17 citations70
US8974682B2Mar 10, 2015
Self-assembled pattern forming method
TOSHIBA KK2 citations63
US8958177B2Feb 17, 2015
Magnetic recording medium and method of fabricating the same
TOSHIBA KK2 citations63
US7081328B2Jul 25, 2006
Optical disk having super-resolution film
TOSHIBA KK5 citations63
US6177229B1Jan 23, 2001
Photosensitive composition
TOSHIBA KK3 citations63
US7270916B2Sep 18, 2007
Recording medium
TOSHIBA KK4 citations62
US6811897B2Nov 2, 2004
Ink for forming a hole injection layer of organic EL display devices and manufacturing method thereof, organic EL display devices, and manufacturing method of the same
TOSHIBA KK3 citations62
US6306553B1Oct 23, 2001
Photosensitive composition and method of forming a pattern using the same
TOSHIBA KK2 citations61
US9269387B2Feb 23, 2016
Magnetic recording medium and method of fabricating the same
TOSHIBA KK0 citations52
US9050752B2Jun 9, 2015
Imprint method
TOSHIBA KK1 citations52
US8865010B2Oct 21, 2014
Pattern forming method and imprint mold manufacturing method
TOSHIBA KK1 citations52
US9281480B2Mar 8, 2016
Method for forming pattern and method for manufacturing semiconductor device
TOSHIBA KK0 citations51
US7740961B2Jun 22, 2010
Magnetic recording medium
TOSHIBA KK0 citations49
US8377551B2Feb 19, 2013
Structure for recording medium
TOSHIBA KK0 citations42
US7618675B2Nov 17, 2009
Pattern forming method and method of processing a structure by use of same
TOSHIBA KK0 citations42