Inventor
KOZAKAI HIROFUMI
JP17 patents
Patents
17 patentsUS10001699B2Jun 19, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP6 citations83
US11650494B2May 16, 2023
Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
HOYA CORP2 citations72
US11480867B2Oct 25, 2022
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP4 citations72
US11256167B2Feb 22, 2022
Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
HOYA CORP2 citations72
US11003068B2May 11, 2021
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US9897909B2Feb 20, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations72
US9740091B2Aug 22, 2017
Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device
HOYA CORP4 citations72
US12135496B2Nov 5, 2024
Reflective mask blank and reflective mask
HOYA CORP0 citations62
US11880130B2Jan 23, 2024
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11454878B2Sep 27, 2022
Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US9494851B2Nov 15, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US9348217B2May 24, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US10620527B2Apr 14, 2020
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10429728B2Oct 1, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10295900B2May 21, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10347485B2Jul 9, 2019
Reflective mask blank, method for manufacturing same, reflective mask, method for manufacturing same, and method for manufacturing semiconductor device
HOYA CORP0 citations50
US9507254B2Nov 29, 2016
Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device
HOYA CORP0 citations41