Inventor
HORIKAWA JUNICHI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “HORIKAWA JUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
19 patentsUS6287429B1Sep 11, 2001
Magnetic recording medium having an improved magnetic characteristic
HOYA CORP87 citations98
US6670055B2Dec 30, 2003
Magnetic recording medium and manufacturing method therefor
HOYA CORP87 citations97
US5640089AJun 17, 1997
Method and apparatus for surface roughness detection - using a magnetoresistive element
HOYA CORP38 citations92
US7208238B2Apr 24, 2007
Substrate for information recording medium, information recording medium and process for producing information recording medium
HOYA CORP10 citations84
US10001699B2Jun 19, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP6 citations83
US5954927ASep 21, 1999
Method of manufacturing magnetic recording medium
HOYA CORP12 citations73
US5746893AMay 5, 1998
Method of manufacturing magnetic recording medium
HOYA CORP6 citations73
US9897909B2Feb 20, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations72
US7972662B2Jul 5, 2011
Substrate for information recording medium, information recording medium and process for producing information recording medium
HOYA CORP2 citations62
US9494851B2Nov 15, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US9348217B2May 24, 2016
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations61
US11237472B2Feb 1, 2022
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP0 citations58
US10620527B2Apr 14, 2020
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10429728B2Oct 1, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10295900B2May 21, 2019
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP0 citations51
US10025176B2Jul 17, 2018
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device
HOYA CORP0 citations51
US9581895B2Feb 28, 2017
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device
HOYA CORP0 citations51
US7357998B2Apr 15, 2008
Disk substrate for a perpendicular magnetic recording medium, perpendicular magnetic recording disk and manufacturing methods thereof
HOYA CORP0 citations51
US9507254B2Nov 29, 2016
Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device
HOYA CORP0 citations41