Inventor
SASAO NORIKATSU
JP22 patents
⚠️ This page may combine multiple inventors who share the name “SASAO NORIKATSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KIOXIA CORP
11 patentsUS12424433B2Sep 23, 2025
Method for manufacturing metal fluoride-containing organic polymer film, patterning method, and method for manufacturing semiconductor device
KIOXIA CORP0 citations62
US12353131B2Jul 8, 2025
Method for manufacturing indium-containing organic polymer film, patterning method, and method for manufacturing semiconductor device
KIOXIA CORP0 citations62
US12228860B2Feb 18, 2025
Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device
KIOXIA CORP0 citations62
US12018107B2Jun 25, 2024
Polymer material, composition, and method of manufacturing semiconductor device
KIOXIA CORP0 citations62
US11820840B2Nov 21, 2023
Compound, polymer, pattern forming material, and manufacturing method of semiconductor device
KIOXIA CORP0 citations62
US11796915B2Oct 24, 2023
Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device
KIOXIA CORP0 citations62
US11639402B2May 2, 2023
Polymer for pattern forming material
KIOXIA CORP0 citations62
US11410848B2Aug 9, 2022
Method of forming pattern, method of manufacturing semiconductor device, and pattern-forming material
KIOXIA CORP0 citations62
US11393671B2Jul 19, 2022
Method of forming pattern and method of manufacturing semiconductor device
KIOXIA CORP0 citations62
US11320736B2May 3, 2022
Pattern forming material and pattern forming method
KIOXIA CORP0 citations52
US11378885B2Jul 5, 2022
Pattern formation material and pattern formation method
KIOXIA CORP0 citations49
TOSHIBA MEMORY CORP
6 patentsUS10672621B2Jun 2, 2020
Pattern forming material, pattern forming method, and method for manufacturing semiconductor device
TOSHIBA MEMORY CORP2 citations73
US11192971B2Dec 7, 2021
Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP2 citations72
US11192972B2Dec 7, 2021
Polymer material, composition, and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP0 citations62
US11177129B2Nov 16, 2021
Method of manufacturing semiconductor device, method of forming pattern film, and metal-containing organic film
TOSHIBA MEMORY CORP0 citations62
US11161999B2Nov 2, 2021
Pattern formation method, block copolymer, and pattern formation material
TOSHIBA MEMORY CORP0 citations62
US10877374B2Dec 29, 2020
Pattern formation method and pattern formation material
TOSHIBA MEMORY CORP0 citations49