Inventor
NAGAMINE SHUICHI
JP28 patents
⚠️ This page may combine multiple inventors who share the name “NAGAMINE SHUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS6514570B1Feb 4, 2003
Solution processing apparatus and method
TOKYO ELECTRON LTD90 citations98
US6843259B2Jan 18, 2005
Solution treatment unit
TOKYO ELECTRON LTD26 citations92
US6730599B2May 4, 2004
Film forming method and film forming apparatus
TOKYO ELECTRON LTD18 citations92
US6715943B2Apr 6, 2004
Solution treatment method and solution treatment unit
TOKYO ELECTRON LTD47 citations92
US6602382B1Aug 5, 2003
Solution processing apparatus
TOKYO ELECTRON LTD49 citations92
US6541376B2Apr 1, 2003
Film forming method and film forming apparatus
TOKYO ELECTRON LTD24 citations92
US6533864B1Mar 18, 2003
Solution processing apparatus and method
TOKYO ELECTRON LTD53 citations92
US6384894B2May 7, 2002
Developing method and developing unit
TOKYO ELECTRON LTD36 citations92
US6364547B1Apr 2, 2002
Solution processing apparatus
TOKYO ELECTRON LTD38 citations92
US6267516B1Jul 31, 2001
Developing apparatus and developing nozzle
TOKYO ELECTRON LTD35 citations92
US6332723B1Dec 25, 2001
Substrate processing apparatus and method
TOKYO ELECTRON LTD51 citations91
USD610176SFeb 16, 2010
Coater cup
TOKYO ELECTRON LTD37 citations90
US6241402B1Jun 5, 2001
Developing apparatus and method thereof
TOKYO ELECTRON LTD19 citations84
US10700166B2Jun 30, 2020
Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus
TOKYO ELECTRON LTD4 citations73
US7665918B2Feb 23, 2010
Developing apparatus, developing method and storage medium
TOKYO ELECTRON LTD4 citations63
US9275881B2Mar 1, 2016
Liquid processing apparatus, liquid processing method, and storage medium
TOKYO ELECTRON LTD1 citations52
US9266153B2Feb 23, 2016
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD1 citations52
US9346084B2May 24, 2016
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD0 citations42
OGATA NOBUHIRO
5 patentsUS8869811B2Oct 28, 2014
Liquid processing apparatus and liquid processing method
OGATA NOBUHIRO5 citations72
US8539906B2Sep 24, 2013
Substrate liquid processing apparatus
OGATA NOBUHIRO5 citations72
US8881751B2Nov 11, 2014
Substrate liquid processing apparatus, method of controlling substrate liquid processing apparatus, and storage medium performing substrate liquid processing apparatus control method on substrate liquid processing apparatus
OGATA NOBUHIRO3 citations62
US8840752B2Sep 23, 2014
Flow passage switching apparatus, processing apparatus, flow passage switching method, processing method and storage medium
OGATA NOBUHIRO3 citations62
US9484230B2Nov 1, 2016
Substrate liquid processing apparatus
OGATA NOBUHIRO1 citations51
HIGASHIJIMA JIRO
3 patentsUS9355871B2May 31, 2016
Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup
HIGASHIJIMA JIRO8 citations84
US9048269B2Jun 2, 2015
Substrate liquid treatment apparatus with lift pin plate
HIGASHIJIMA JIRO6 citations73
US9022045B2May 5, 2015
Substrate liquid cleaning apparatus with controlled liquid port ejection angle
HIGASHIJIMA JIRO0 citations41