Inventor

MIYANAGA ISAO

JP24 patents

⚠️ This page may combine multiple inventors who share the name “MIYANAGA ISAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIYANAGA ISAO

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Semiconductor wafer package, method and apparatus for connecting testing IC terminals of semiconductor wafer and probe terminals, testing method of a semiconductor integrated circuit, probe card and its manufacturing method

Semiconductor wafer package, method and apparatus for connecting testing IC terminals of semiconductor wafer and probe terminals, testing method of a semiconductor integrated circuit, probe card and its manufacturing method

Probe sheet and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Method of forming insulating film and method of fabricating semiconductor device

Semiconductor wafer package, method and apparatus for connecting testing IC terminals of semiconductor wafer and probe terminals, testing method of a semiconductor integrated circuit, probe card and its manufacturing method

Semiconductor device which reduces the minimum distance requirements between active areas

Semiconductor integrated circuit device

Method of fabricating a semiconductor device

Method of fabricating capacitor or contact for semiconductor device by forming uneven oxide film and reacting silicon with metal containing gas

MOS transistor for protection against electrostatic discharge

Method for extending electrically conductive layer into electrically insulating layer

Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating film

Semiconductor integrated circuit device having failure detection circuitry

Unsymmetrical MOS device having a gate insulator area offset from the source and drain areas, and ESD protection circuit including such a MOS device

Semiconductor device for protecting an internal circuit from electrostatic damage

Method of fabricating a semiconductor device

Semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device and manufacturing method thereof

Semiconductor device and method of manufacturing the same

Semiconductor device and manufacturing method thereof

PANASONIC CORP

Semiconductor device and method for fabricating the same

Semiconductor device having silicide transistors and non-silicide transistors formed on the same substrate and method for fabricating the same