Inventor
CHENG ZHAOHUI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “CHENG ZHAOHUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
19 patentsUS7683319B2Mar 23, 2010
Charge control apparatus and measurement apparatus equipped with the charge control apparatus
HITACHI HIGH TECH CORP36 citations92
US7655906B2Feb 2, 2010
Method and apparatus for scanning and measurement by electron beam
HITACHI HIGH TECH CORP13 citations83
US7394070B2Jul 1, 2008
Method and apparatus for inspecting patterns
HITACHI HIGH TECH CORP14 citations83
US7218126B2May 15, 2007
Inspection method and apparatus for circuit pattern
HITACHI HIGH TECH CORP7 citations74
US6952105B2Oct 4, 2005
Inspection method and apparatus for circuit pattern of resist material
HITACHI HIGH TECH CORP7 citations74
US9287084B2Mar 15, 2016
Aberration corrector and charged particle beam apparatus using the same
HITACHI HIGH TECH CORP3 citations71
US7633303B2Dec 15, 2009
Semiconductor wafer inspection apparatus
HITACHI HIGH TECH CORP2 citations63
US12400383B2Aug 26, 2025
Training method for learning apparatus, and image generation system
HITACHI HIGH TECH CORP0 citations62
US12340970B2Jun 24, 2025
Charged particle beam device, and method for controlling charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US10840060B2Nov 17, 2020
Scanning electron microscope and sample observation method
HITACHI HIGH TECH CORP1 citations62
US7910884B2Mar 22, 2011
Apparatus and method for inspection and measurement
HITACHI HIGH TECH CORP2 citations62
US7547884B2Jun 16, 2009
Pattern defect inspection method and apparatus thereof
HITACHI HIGH TECH CORP4 citations62
US10446361B2Oct 15, 2019
Aberration correction method, aberration correction system, and charged particle beam apparatus
HITACHI HIGH TECH CORP1 citations61
US7928384B2Apr 19, 2011
Localized static charge distribution precision measurement method and device
HITACHI HIGH TECH CORP2 citations58
US11769649B2Sep 26, 2023
Multipole unit and charged particle beam device
HITACHI HIGH TECH CORP0 citations53
US12327708B2Jun 10, 2025
Charged particle beam device and aberration correction method
HITACHI HIGH TECH CORP0 citations51
US7652248B2Jan 26, 2010
Inspection apparatus and inspection method
HITACHI HIGH TECH CORP0 citations51
US10727024B2Jul 28, 2020
Charged particle beam device and aberration correction method for charged particle beam device
HITACHI HIGH TECH CORP0 citations40
US7714288B2May 11, 2010
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations40