Inventor
SUSA YOSHIO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “SUSA YOSHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASM IP HOLDING BV
15 patentsUS10290508B1May 14, 2019
Method for forming vertical spacers for spacer-defined patterning
ASM IP HOLDING BV414 citations98
US10844484B2Nov 24, 2020
Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
ASM IP HOLDING BV10 citations83
US10755922B2Aug 25, 2020
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
ASM IP HOLDING BV8 citations83
US12125700B2Oct 22, 2024
Method of forming high aspect ratio features
ASM IP HOLDING BV2 citations71
US11646197B2May 9, 2023
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
ASM IP HOLDING BV1 citations61
US11626316B2Apr 11, 2023
Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
ASM IP HOLDING BV1 citations61
US11348766B2May 31, 2022
Substrate processing apparatus
ASM IP HOLDING BV0 citations61
US10629415B2Apr 21, 2020
Substrate processing apparatus and method for processing substrate
ASM IP HOLDING BV1 citations61
US12506000B2Dec 23, 2025
Method of filling gap with flowable carbon layer
ASM IP HOLDING BV0 citations59
US11705333B2Jul 18, 2023
Structures including multiple carbon layers and methods of forming and using same
ASM IP HOLDING BV0 citations59
US12571091B2Mar 10, 2026
Method for forming carbon film and film forming apparatus
ASM IP HOLDING BV0 citations51
US12385131B2Aug 12, 2025
Method of forming a structure including a silicon carbide layer
ASM IP HOLDING BV0 citations50
US12040177B2Jul 16, 2024
Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
ASM IP HOLDING BV0 citations50
US11430674B2Aug 30, 2022
Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
ASM IP HOLDING BV0 citations50
US10707073B2Jul 7, 2020
Film forming method and patterning method
ASM IP HOLDING BV0 citations48