P

Inventor

ZHAO JIANPING

CN67 patents
⚠️ This page may combine multiple inventors who share the name “ZHAO JIANPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

29 patents
US10991554B2Apr 27, 2021

Plasma processing system with synchronized signal modulation

TOKYO ELECTRON LTD49 citations94
US9209032B2Dec 8, 2015

Electric pressure systems for control of plasma properties and uniformity

TOKYO ELECTRON LTD42 citations94
US11295937B2Apr 5, 2022

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD7 citations86
US9396900B2Jul 19, 2016

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

TOKYO ELECTRON LTD10 citations84
US11430643B2Aug 30, 2022

Quantification of processing chamber species by electron energy sweep

TOKYO ELECTRON LTD7 citations83
US11728135B2Aug 15, 2023

Electric pressure systems for control of plasma properties and uniformity

TOKYO ELECTRON LTD2 citations73
US11348761B2May 31, 2022

Impedance matching apparatus and control method

TOKYO ELECTRON LTD4 citations73
US11170981B2Nov 9, 2021

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD2 citations73
US9431218B2Aug 30, 2016

Scalable and uniformity controllable diffusion plasma source

TOKYO ELECTRON LTD5 citations73
US12300466B2May 13, 2025

Plasma enhanced film formation method

TOKYO ELECTRON LTD0 citations62
US12176204B2Dec 24, 2024

Cyclic low temperature film growth processes

TOKYO ELECTRON LTD0 citations62
US11830709B2Nov 28, 2023

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD1 citations62
US11773484B2Oct 3, 2023

Hard mask deposition using direct current superimposed radio frequency plasma

TOKYO ELECTRON LTD0 citations62
US11605536B2Mar 14, 2023

Cyclic low temperature film growth processes

TOKYO ELECTRON LTD1 citations62
US10354841B2Jul 16, 2019

Plasma generation and control using a DC ring

TOKYO ELECTRON LTD1 citations62
US8669705B2Mar 11, 2014

Stable surface wave plasma source

TOKYO ELECTRON LTD3 citations61
US12387910B2Aug 12, 2025

Plasma processing with broadband RF waveforms

TOKYO ELECTRON LTD0 citations60
US12020902B2Jun 25, 2024

Plasma processing with broadband RF waveforms

TOKYO ELECTRON LTD0 citations60
US10424462B2Sep 24, 2019

Multi-cell resonator microwave surface-wave plasma apparatus

TOKYO ELECTRON LTD1 citations56
US10796916B2Oct 6, 2020

Microwave plasma device

TOKYO ELECTRON LTD0 citations52
US10375812B2Aug 6, 2019

Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatus

TOKYO ELECTRON LTD0 citations52
US10354837B2Jul 16, 2019

Controlling etch rate drift and particles during plasma processing

TOKYO ELECTRON LTD0 citations52
US9947515B2Apr 17, 2018

Microwave surface-wave plasma device

TOKYO ELECTRON LTD0 citations52
US9941126B2Apr 10, 2018

Microwave plasma device

TOKYO ELECTRON LTD1 citations52
US9934974B2Apr 3, 2018

Microwave plasma device

TOKYO ELECTRON LTD0 citations52
US9881804B2Jan 30, 2018

Method and system for high precision etching of substrates

TOKYO ELECTRON LTD0 citations52
US9793095B2Oct 17, 2017

Microwave surface-wave plasma device

TOKYO ELECTRON LTD0 citations52
US9301383B2Mar 29, 2016

Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus

TOKYO ELECTRON LTD0 citations52
US12387919B2Aug 12, 2025

ALD process with plasma treatment

TOKYO ELECTRON LTD0 citations51

HUAWEI TECH CO LTD

7 patents

CHEN LEE

4 patents

ZHAO JIANPING

4 patents

FUNK MERRITT

2 patents

CHEN ZHIYING

2 patents

UNIV QUFU NORMAL

1 patent

BRAVENEC RONALD VICTOR

1 patent

Showing the top 50 of 67 patents by PatentIndex Score.