Inventor
ZHAO JIANPING
CN67 patents
⚠️ This page may combine multiple inventors who share the name “ZHAO JIANPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
29 patentsUS10991554B2Apr 27, 2021
Plasma processing system with synchronized signal modulation
TOKYO ELECTRON LTD49 citations94
US9209032B2Dec 8, 2015
Electric pressure systems for control of plasma properties and uniformity
TOKYO ELECTRON LTD42 citations94
US11295937B2Apr 5, 2022
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD7 citations86
US9396900B2Jul 19, 2016
Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties
TOKYO ELECTRON LTD10 citations84
US11430643B2Aug 30, 2022
Quantification of processing chamber species by electron energy sweep
TOKYO ELECTRON LTD7 citations83
US11728135B2Aug 15, 2023
Electric pressure systems for control of plasma properties and uniformity
TOKYO ELECTRON LTD2 citations73
US11348761B2May 31, 2022
Impedance matching apparatus and control method
TOKYO ELECTRON LTD4 citations73
US11170981B2Nov 9, 2021
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD2 citations73
US9431218B2Aug 30, 2016
Scalable and uniformity controllable diffusion plasma source
TOKYO ELECTRON LTD5 citations73
US12300466B2May 13, 2025
Plasma enhanced film formation method
TOKYO ELECTRON LTD0 citations62
US12176204B2Dec 24, 2024
Cyclic low temperature film growth processes
TOKYO ELECTRON LTD0 citations62
US11830709B2Nov 28, 2023
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD1 citations62
US11773484B2Oct 3, 2023
Hard mask deposition using direct current superimposed radio frequency plasma
TOKYO ELECTRON LTD0 citations62
US11605536B2Mar 14, 2023
Cyclic low temperature film growth processes
TOKYO ELECTRON LTD1 citations62
US10354841B2Jul 16, 2019
Plasma generation and control using a DC ring
TOKYO ELECTRON LTD1 citations62
US8669705B2Mar 11, 2014
Stable surface wave plasma source
TOKYO ELECTRON LTD3 citations61
US12387910B2Aug 12, 2025
Plasma processing with broadband RF waveforms
TOKYO ELECTRON LTD0 citations60
US12020902B2Jun 25, 2024
Plasma processing with broadband RF waveforms
TOKYO ELECTRON LTD0 citations60
US10424462B2Sep 24, 2019
Multi-cell resonator microwave surface-wave plasma apparatus
TOKYO ELECTRON LTD1 citations56
US10796916B2Oct 6, 2020
Microwave plasma device
TOKYO ELECTRON LTD0 citations52
US10375812B2Aug 6, 2019
Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatus
TOKYO ELECTRON LTD0 citations52
US10354837B2Jul 16, 2019
Controlling etch rate drift and particles during plasma processing
TOKYO ELECTRON LTD0 citations52
US9947515B2Apr 17, 2018
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US9941126B2Apr 10, 2018
Microwave plasma device
TOKYO ELECTRON LTD1 citations52
US9934974B2Apr 3, 2018
Microwave plasma device
TOKYO ELECTRON LTD0 citations52
US9881804B2Jan 30, 2018
Method and system for high precision etching of substrates
TOKYO ELECTRON LTD0 citations52
US9793095B2Oct 17, 2017
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US9301383B2Mar 29, 2016
Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus
TOKYO ELECTRON LTD0 citations52
US12387919B2Aug 12, 2025
ALD process with plasma treatment
TOKYO ELECTRON LTD0 citations51
HUAWEI TECH CO LTD
7 patentsUS10069215B2Sep 4, 2018
Multi-beam antenna system and phase adjustment method for multi-beam antenna system, and dual-polarized antenna system
HUAWEI TECH CO LTD2 citations73
US10333220B2Jun 25, 2019
Interleaved polarized multi-beam antenna
HUAWEI TECH CO LTD2 citations69
US11469525B2Oct 11, 2022
Antenna system, feeding network reconfiguration method, and apparatus
HUAWEI TECH CO LTD2 citations66
US12451906B2Oct 21, 2025
Radio frequency unit, antenna, and signal processing method
HUAWEI TECH CO LTD0 citations58
US10879610B2Dec 29, 2020
Antenna apparatus and beam adjustment method
HUAWEI TECH CO LTD1 citations58
US10205236B2Feb 12, 2019
Antenna system
HUAWEI TECH CO LTD0 citations52
US9906351B2Feb 27, 2018
Method of communication with distributed antenna array system and array system
HUAWEI TECH CO LTD1 citations52
CHEN LEE
4 patentsUS8415884B2Apr 9, 2013
Stable surface wave plasma source
CHEN LEE240 citations97
US8883024B2Nov 11, 2014
Using vacuum ultra-violet (VUV) data in radio frequency (RF) sources
CHEN LEE11 citations84
US8877080B2Nov 4, 2014
Using vacuum ultra-violet (VUV) data in microwave sources
CHEN LEE10 citations84
US8847159B2Sep 30, 2014
Ion energy analyzer
CHEN LEE6 citations84
ZHAO JIANPING
4 patentsUS8968588B2Mar 3, 2015
Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatus
ZHAO JIANPING23 citations91
US8323521B2Dec 4, 2012
Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques
ZHAO JIANPING5 citations62
US11925889B1Mar 12, 2024
Spliceable and foldable filter element device
ZHAO JIANPING0 citations51
US11562867B2Jan 24, 2023
Movable contact mechanism of double-breakpoint circuit breaker
ZHAO JIANPING0 citations51
FUNK MERRITT
2 patentsCHEN ZHIYING
2 patentsUS8486798B1Jul 16, 2013
Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof
CHEN ZHIYING6 citations83
US8721833B2May 13, 2014
Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof
CHEN ZHIYING4 citations72
UNIV QUFU NORMAL
1 patentBRAVENEC RONALD VICTOR
1 patentShowing the top 50 of 67 patents by PatentIndex Score.