Inventor
YANG MIN-CHIEH
TW23 patents
⚠️ This page may combine multiple inventors who share the name “YANG MIN-CHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ENTEGRIS INC
8 patentsUS11053440B2Jul 6, 2021
Silicon nitride etching composition and method
ENTEGRIS INC3 citations71
US10651045B2May 12, 2020
Compositions and methods for etching silicon nitride-containing substrates
ENTEGRIS INC3 citations68
US11788007B2Oct 17, 2023
Method for removing hard masks
ENTEGRIS INC0 citations61
US11697767B2Jul 11, 2023
Silicon nitride etching composition and method
ENTEGRIS INC0 citations57
US10290505B2May 14, 2019
Passivation of germanium surfaces
ENTEGRIS INC0 citations50
US9765288B2Sep 19, 2017
Compositions for cleaning III-V semiconductor materials and methods of using same
ENTEGRIS INC0 citations40
US12129418B2Oct 29, 2024
Selective etchant compositions and methods
ENTEGRIS INC0 citations38
US10340150B2Jul 2, 2019
Ni:NiGe:Ge selective etch formulations and method of using same
ENTEGRIS INC0 citations38
UNITED MICROELECTRONICS CORP
6 patentsUS7709275B2May 4, 2010
Method of forming a pattern for a semiconductor device and method of forming the related MOS transistor
UNITED MICROELECTRONICS CORP9 citations83
US7303962B2Dec 4, 2007
Fabricating method of CMOS and MOS device
UNITED MICROELECTRONICS CORP7 citations68
US7851370B2Dec 14, 2010
Patterning method
UNITED MICROELECTRONICS CORP4 citations62
US7592265B2Sep 22, 2009
Method of trimming a hard mask layer, method for fabricating a gate in a MOS transistor, and a stack for fabricating a gate in a MOS transistor
UNITED MICROELECTRONICS CORP6 citations62
US7531434B2May 12, 2009
Method of fabricating semiconductor devices
UNITED MICROELECTRONICS CORP0 citations48
US7601587B2Oct 13, 2009
Fabricating method of CMOS
UNITED MICROELECTRONICS CORP0 citations42