Inventor
SHIH SHIH-CHANG
TW16 patents
⚠️ This page may combine multiple inventors who share the name “SHIH SHIH-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
13 patentsUS11086209B2Aug 10, 2021
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US11809075B2Nov 7, 2023
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10534279B1Jan 14, 2020
Methods and apparatus for removing contamination from lithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10162277B2Dec 25, 2018
Extreme ultraviolet lithography system with debris trapper on exhaust line
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations68
US12535727B2Jan 27, 2026
EUV lithography mask with a porous reflective multilayer structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12276923B2Apr 15, 2025
Exhaust system with U-shaped pipes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11994809B2May 28, 2024
Exhaust system with u-shaped pipes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11681232B2Jun 20, 2023
Exhaust system with u-shaped pipes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10983447B2Apr 20, 2021
Exhaust system with u-shaped pipes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11657492B2May 23, 2023
Reticle backside inspection method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10997706B2May 4, 2021
Reticle backside inspection method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10852649B2Dec 1, 2020
Methods and apparatus for removing contamination from lithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10509334B2Dec 17, 2019
Methods and apparatus for removing contamination from lithographic tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
TAIWAN SEMICONDUCTOR MFG
3 patentsUS6042976AMar 28, 2000
Method of calibrating WEE exposure tool
TAIWAN SEMICONDUCTOR MFG51 citations86
US6273935B1Aug 14, 2001
Apparatus and method for trapping a toxic gas
TAIWAN SEMICONDUCTOR MFG5 citations60
US6820491B2Nov 23, 2004
Pressure differential measuring tool
TAIWAN SEMICONDUCTOR MFG0 citations42