P

Inventor

CHEN YU-YU

TW68 patents
⚠️ This page may combine multiple inventors who share the name “CHEN YU-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

24 patents
US9818613B1Nov 14, 2017

Self-aligned double spacer patterning process

TAIWAN SEMICONDUCTOR MFG CO LTD17 citations91
US10170307B1Jan 1, 2019

Method for patterning semiconductor device using masking layer

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US10269576B1Apr 23, 2019

Etching and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations82
US10157776B2Dec 18, 2018

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations82
US11676821B2Jun 13, 2023

Self-aligned double patterning

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US11244858B2Feb 8, 2022

Etching to reduce line wiggling

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10672614B2Jun 2, 2020

Etching and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10056258B2Aug 21, 2018

Self-aligned double spacer patterning process

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12535730B2Jan 27, 2026

Photomask having recessed region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11914288B2Feb 27, 2024

Photomask having recessed region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11099478B2Aug 24, 2021

Photomask having recessed region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12183628B2Dec 31, 2024

Integrated circuit and method for manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12068167B2Aug 20, 2024

Self-aligned double patterning

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12014952B2Jun 18, 2024

Lithography method to reduce spacing between interconnect wires in interconnect structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11784056B2Oct 10, 2023

Self-aligned double patterning

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11728209B2Aug 15, 2023

Lithography method to reduce spacing between interconnect wires in interconnect structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11456210B2Sep 27, 2022

Integrated circuit and method for manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12322651B2Jun 3, 2025

Etching to reduce line wiggling

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11355388B2Jun 7, 2022

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12444646B2Oct 14, 2025

Devices with reduced capacitances

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12046506B2Jul 23, 2024

Devices with reduced capacitances

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12581721B2Mar 17, 2026

Method for gap filling with selectively formed seed layer and heteroepitaxial cap layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US12443114B2Oct 14, 2025

Particle removal method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US11852982B2Dec 26, 2023

Semiconductor manufacturing system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57

CHEN YU-YU

11 patents

ANPEC ELECTRONICS CORP

3 patents

(unassigned)

2 patents

BION INC

2 patents

TAIWAN SEMICONDUCTOR MFG

1 patent

LIANG MING-CHUNG

1 patent

TSAI HSIN-YI

1 patent

PAN CHIH-LIANG

1 patent

AU OPTRONICS CORP

1 patent

LIN TSUNG-HSIEN

1 patent

HTC CORP

1 patent

DIRECTION TECH CO LTD

1 patent

Showing the top 50 of 68 patents by PatentIndex Score.