Inventor

PARK WAN JAE

KR34 patents

⚠️ This page may combine multiple inventors who share the name “PARK WAN JAE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARK WAN JAE

SAMSUNG ELECTRONICS CO LTD

Method of fabricating dual damascene interconnections of microelectronic device using hybrid low k-dielectric and carbon-free inorganic filler

Method for forming a dual damascene wiring pattern in a semiconductor device

Method of and apparatus for manufacturing a semiconductor device using a polysilicon hard mask

Inter-metal dielectric patterns and method of forming the same

Method of determining degree of charge-up induced by plasma used for manufacturing semiconductor device and apparatus therefor

Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers

Method of forming interlevel dielectric layer of semiconductor device

Method for forming a polysilicon node in a semiconductor device

Method of fabricating interconnections of microelectronic device using dual damascene process

Integrated circuit capacitor structure

Methods of forming integrated circuit devices having metal interconnect structures therein

Dual damascene process

Conducting line of semiconductor device and manufacturing method thereof using aluminum oxide layer as hard mask

Integrated circuit capacitor structure

Method of determining whether a conductive layer of a semiconductor device is exposed through a contact hold

Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing

SEMES CO LTD

Substrate treating method and substrate treating apparatus

Apparatus and method for processing substrate using plasma

Apparatus and method for processing substrate using plasma

Substrate treating apparatus and substrate treating system comprising the same

Method for treating substrate and apparatus for treating substrate

Substrate processing apparatus

Substrate treating method and substrate treating apparatus

Apparatus for treating substrate and method for treating substrate

Apparatus and method for processing substrate

Substrate treating apparatus and substrate treating method

Method for fabricating semiconductor device and apparatus for processing substrate using plasma

Support unit and substrate treating apparatus

Substrate processing apparatus and method using the plasma

Method of forming pattern structure including silicon nitride

Apparatus and method of treating a substrate

TOKYO ELECTRON LTD

Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance

Plasma treatment method to improve photo resist roughness and remove photo resist scum

PARK WAN-JAE

Methods of patterning insulating layers using etching techniques that compensate for etch rate variations