Inventor
ITO KENYA
JP88 patents
⚠️ This page may combine multiple inventors who share the name “ITO KENYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
29 patentsUSD777546SJan 31, 2017
Work holder for polishing apparatus
EBARA CORP407 citations97
US7682225B2Mar 23, 2010
Polishing apparatus and substrate processing apparatus
EBARA CORP46 citations96
US6036582AMar 14, 2000
Polishing apparatus
EBARA CORP61 citations96
US6578891B1Jun 17, 2003
Substrate holder and substrate transfer apparatus using the same
EBARA CORP49 citations93
US7055535B2Jun 6, 2006
Holding unit, processing apparatus and holding method of substrates
EBARA CORP38 citations92
US6932884B2Aug 23, 2005
Substrate processing apparatus
EBARA CORP26 citations92
US6543080B1Apr 8, 2003
Apparatus and method for cleaning semiconductor substrate
EBARA CORP35 citations92
US6494220B1Dec 17, 2002
Apparatus for cleaning a substrate such as a semiconductor wafer
EBARA CORP31 citations92
US6308361B1Oct 30, 2001
Cleaning apparatus
EBARA CORP21 citations92
US6248009B1Jun 19, 2001
Apparatus for cleaning substrate
EBARA CORP30 citations92
US6092542AJul 25, 2000
Cleaning apparatus
EBARA CORP21 citations92
US10328465B2Jun 25, 2019
Substrate processing apparatus and substrate processing method
EBARA CORP6 citations84
US9566616B2Feb 14, 2017
Substrate processing apparatus
EBARA CORP5 citations84
US9248545B2Feb 2, 2016
Substrate processing apparatus and substrate processing method
EBARA CORP7 citations84
US8047896B2Nov 1, 2011
Polishing apparatus, polishing method, and processing apparatus
EBARA CORP11 citations84
US7976361B2Jul 12, 2011
Polishing apparatus and polishing method
EBARA CORP8 citations84
US7862402B2Jan 4, 2011
Polishing apparatus and substrate processing apparatus
EBARA CORP10 citations84
US8029333B2Oct 4, 2011
Device for polishing peripheral edge of semiconductor wafer
EBARA CORP11 citations83
US7476290B2Jan 13, 2009
Substrate processing apparatus and substrate processing method
EBARA CORP9 citations82
US7578886B2Aug 25, 2009
Substrate processing apparatus, substrate processing method, and substrate holding apparatus
EBARA CORP14 citations81
US6141812ANov 7, 2000
Cleaning apparatus and cleaning member rinsing apparatus
EBARA CORP9 citations74
US6116994ASep 12, 2000
Polishing apparatus
EBARA CORP9 citations74
US10155294B2Dec 18, 2018
Polishing apparatus and polishing method
EBARA CORP2 citations73
US9914196B2Mar 13, 2018
Polishing apparatus and polishing method
EBARA CORP2 citations73
US9808903B2Nov 7, 2017
Method of polishing back surface of substrate and substrate processing apparatus
EBARA CORP3 citations73
US9393595B2Jul 19, 2016
Abrasive film fabrication method and abrasive film
EBARA CORP3 citations73
US8748289B2Jun 10, 2014
Method for manufacturing semiconductor device
EBARA CORP5 citations73
US10403505B2Sep 3, 2019
Substrate processing method and substrate processing apparatus
EBARA CORP5 citations72
US9492910B2Nov 15, 2016
Polishing method
EBARA CORP5 citations72
HITACHI LTD
11 patentsUS6183893B1Feb 6, 2001
Perpendicular magnetic recording medium and magnetic storage apparatus using the same
HITACHI LTD123 citations98
US6716516B2Apr 6, 2004
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD30 citations96
US6447936B1Sep 10, 2002
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD41 citations96
US5923485AJul 13, 1999
Storage device for reliably maintaining data in a reproducible state for a long period of time
HITACHI LTD40 citations96
US6403203B2Jun 11, 2002
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD22 citations93
US6083599AJul 4, 2000
Perpendicular magnetic recording media and magnetic recording and reproducing apparatus using the same
HITACHI LTD19 citations92
US6243221B1Jun 5, 2001
Storage device for reliably maintaining data in a reproducible state for a long period of time
HITACHI LTD10 citations82
US6084729AJul 4, 2000
Storage device for reliably maintaining data in a reproducible state for a long period of time
HITACHI LTD14 citations82
US6607849B2Aug 19, 2003
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD3 citations74
US6592976B2Jul 15, 2003
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD6 citations74
US6534164B2Mar 18, 2003
Magnetic recording medium and magnetic recording apparatus using the same
HITACHI LTD4 citations74
CHISSO CORP
5 patentsUS7868112B2Jan 11, 2011
Fluorine-containing polymer and resin composition
CHISSO CORP19 citations92
US7053167B2May 30, 2006
Silsesquioxane derivative having functional group
CHISSO CORP24 citations92
US7373060B2May 13, 2008
Optical waveguide using polymer composed of silsesquioxane derivative
CHISSO CORP15 citations82
US7662985B2Feb 16, 2010
Production process for a silicon compound
CHISSO CORP6 citations73
US7129370B2Oct 31, 2006
Silicon compound and a production process for silicon compound
CHISSO CORP6 citations73
NAKANISHI MASAYUKI
2 patentsTOSHIBA KK
1 patentTAKAHASHI TAMAMI
1 patentSEKI MASAYA
1 patentShowing the top 50 of 88 patents by PatentIndex Score.