Inventor
MATSUHASHI NAOKI
JP8 patents
Patents
8 patentsUS11971653B2Apr 30, 2024
Photomask blank, method for producing photomask, and photomask
SHINETSU CHEMICAL CO3 citations72
US12197121B2Jan 14, 2025
Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask
SHINETSU CHEMICAL CO0 citations60
US11422456B2Aug 23, 2022
Phase shift mask blank, method for producing phase shift mask, and phase shift mask
SHINETSU CHEMICAL CO0 citations60
US11402744B2Aug 2, 2022
Photomask blank, manufacturing method of photomask and photomask
SHINETSU CHEMICAL CO1 citations57
US11131920B2Sep 28, 2021
Photomask blank, and method of manufacturing photomask
SHINETSU CHEMICAL CO0 citations50
US12535728B2Jan 27, 2026
Photomask blank, manufacturing method of photomask and photomask
SHINETSU CHEMICAL CO0 citations47
US12372863B2Jul 29, 2025
Photomask blank, method for producing photomask, and photomask
SHINETSU CHEMICAL CO0 citations41
US10788747B2Sep 29, 2020
Photomask blank and method for producing photomask
SHINETSU CHEMICAL CO0 citations40