Inventor
WU QINGGUO
US16 patents
⚠️ This page may combine multiple inventors who share the name “WU QINGGUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
15 patentsUS7906174B1Mar 15, 2011
PECVD methods for producing ultra low-k dielectric films using UV treatment
NOVELLUS SYSTEMS INC507 citations98
US7208389B1Apr 24, 2007
Method of porogen removal from porous low-k films using UV radiation
NOVELLUS SYSTEMS INC602 citations98
US7241704B1Jul 10, 2007
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups
NOVELLUS SYSTEMS INC58 citations96
US7923385B2Apr 12, 2011
Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups
NOVELLUS SYSTEMS INC17 citations92
US7906817B1Mar 15, 2011
High compressive stress carbon liners for MOS devices
NOVELLUS SYSTEMS INC40 citations92
US7622400B1Nov 24, 2009
Method for improving mechanical properties of low dielectric constant materials
NOVELLUS SYSTEMS INC42 citations92
US7473653B1Jan 6, 2009
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups
NOVELLUS SYSTEMS INC12 citations92
US7390537B1Jun 24, 2008
Methods for producing low-k CDO films with low residual stress
NOVELLUS SYSTEMS INC51 citations92
US7341761B1Mar 11, 2008
Methods for producing low-k CDO films
NOVELLUS SYSTEMS INC17 citations92
US7326444B1Feb 5, 2008
Methods for improving integration performance of low stress CDO films
NOVELLUS SYSTEMS INC30 citations89
US8362571B1Jan 29, 2013
High compressive stress carbon liners for MOS devices
NOVELLUS SYSTEMS INC5 citations84
US7998881B1Aug 16, 2011
Method for making high stress boron-doped carbon films
NOVELLUS SYSTEMS INC11 citations84
US7781351B1Aug 24, 2010
Methods for producing low-k carbon doped oxide films with low residual stress
NOVELLUS SYSTEMS INC14 citations83
US7737525B1Jun 15, 2010
Method for producing low-K CDO films
NOVELLUS SYSTEMS INC9 citations83
US7799705B1Sep 21, 2010
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups
NOVELLUS SYSTEMS INC5 citations74