P

Inventor

FU HAIYING

US36 patents
⚠️ This page may combine multiple inventors who share the name “FU HAIYING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOVELLUS SYSTEMS INC

28 patents
US7208389B1Apr 24, 2007

Method of porogen removal from porous low-k films using UV radiation

NOVELLUS SYSTEMS INC602 citations98
US7253125B1Aug 7, 2007

Method to improve mechanical strength of low-k dielectric film using modulated UV exposure

NOVELLUS SYSTEMS INC82 citations97
US7094713B1Aug 22, 2006

Methods for improving the cracking resistance of low-k dielectric materials

NOVELLUS SYSTEMS INC74 citations97
US7241704B1Jul 10, 2007

Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups

NOVELLUS SYSTEMS INC58 citations96
US7611757B1Nov 3, 2009

Method to improve mechanical strength of low-K dielectric film using modulated UV exposure

NOVELLUS SYSTEMS INC39 citations95
US7282438B1Oct 16, 2007

Low-k SiC copper diffusion barrier films

NOVELLUS SYSTEMS INC53 citations95
US6855645B2Feb 15, 2005

Silicon carbide having low dielectric constant

NOVELLUS SYSTEMS INC61 citations95
US9523155B2Dec 20, 2016

Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating

NOVELLUS SYSTEMS INC15 citations92
US8043667B1Oct 25, 2011

Method to improve mechanical strength of low-K dielectric film using modulated UV exposure

NOVELLUS SYSTEMS INC18 citations92
US7968436B1Jun 28, 2011

Low-K SiC copper diffusion barrier films

NOVELLUS SYSTEMS INC15 citations92
US7923385B2Apr 12, 2011

Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups

NOVELLUS SYSTEMS INC17 citations92
US7906817B1Mar 15, 2011

High compressive stress carbon liners for MOS devices

NOVELLUS SYSTEMS INC40 citations92
US7573061B1Aug 11, 2009

Low-k SiC copper diffusion barrier films

NOVELLUS SYSTEMS INC24 citations92
US7473653B1Jan 6, 2009

Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups

NOVELLUS SYSTEMS INC12 citations92
US7390537B1Jun 24, 2008

Methods for producing low-k CDO films with low residual stress

NOVELLUS SYSTEMS INC51 citations92
US7381662B1Jun 3, 2008

Methods for improving the cracking resistance of low-k dielectric materials

NOVELLUS SYSTEMS INC32 citations92
US7341761B1Mar 11, 2008

Methods for producing low-k CDO films

NOVELLUS SYSTEMS INC17 citations92
US6764952B1Jul 20, 2004

Systems and methods to retard copper diffusion and improve film adhesion for a dielectric barrier on copper

NOVELLUS SYSTEMS INC28 citations92
US7326444B1Feb 5, 2008

Methods for improving integration performance of low stress CDO films

NOVELLUS SYSTEMS INC30 citations89
US6777349B2Aug 17, 2004

Hermetic silicon carbide

NOVELLUS SYSTEMS INC28 citations87
US8362571B1Jan 29, 2013

High compressive stress carbon liners for MOS devices

NOVELLUS SYSTEMS INC5 citations84
US9834852B2Dec 5, 2017

Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating

NOVELLUS SYSTEMS INC13 citations83
US9746427B2Aug 29, 2017

Detection of plating on wafer holding apparatus

NOVELLUS SYSTEMS INC9 citations83
US7781351B1Aug 24, 2010

Methods for producing low-k carbon doped oxide films with low residual stress

NOVELLUS SYSTEMS INC14 citations83
US7737525B1Jun 15, 2010

Method for producing low-K CDO films

NOVELLUS SYSTEMS INC9 citations83
US7799705B1Sep 21, 2010

Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups

NOVELLUS SYSTEMS INC5 citations74
US10662545B2May 26, 2020

Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating

NOVELLUS SYSTEMS INC4 citations72
US9816196B2Nov 14, 2017

Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyte

NOVELLUS SYSTEMS INC1 citations48

FU HAIYING

4 patents

LAM RES CORP

2 patents

BANDYOPADHYAY ANANDA K

1 patent

UNIV SOUTHWEST JIAOTONG

1 patent