Inventor
KURIBAYASHI KOEI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “KURIBAYASHI KOEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
11 patentsUS12540388B2Feb 3, 2026
Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US12148621B2Nov 19, 2024
Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations61
US12065736B2Aug 20, 2024
Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations61
US12053805B2Aug 6, 2024
Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US11788188B2Oct 17, 2023
Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations61
US11621169B2Apr 4, 2023
Method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations61
US12529137B2Jan 20, 2026
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations58
US12148614B2Nov 19, 2024
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations58
US11753716B2Sep 12, 2023
Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations58
US12139787B2Nov 12, 2024
Apparatus and method for cleaning reaction vessel for processing substrate
KOKUSAI ELECTRIC CORP0 citations51
US11814725B2Nov 14, 2023
Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations44
HITACHI INT ELECTRIC INC
4 patentsUS10784116B2Sep 22, 2020
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC3 citations69
US9508531B2Nov 29, 2016
Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber
HITACHI INT ELECTRIC INC2 citations61
US9982347B2May 29, 2018
Cleaning method, method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations51
US9976214B2May 22, 2018
Cleaning method and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations50
SASAKI TAKAFUMI
2 patentsUS8889533B2Nov 18, 2014
Method of manufacturing semiconductor device, method of manufacturing substrate and substrate processing apparatus
SASAKI TAKAFUMI0 citations40
US8450220B2May 28, 2013
Substrate processing apparatus , method of manufacturing semiconductor device, and method of manufacturing substrate
SASAKI TAKAFUMI0 citations40