Inventor

PARK BEOM SOO

KR68 patents

⚠️ This page may combine multiple inventors who share the name “PARK BEOM SOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARK BEOM SOO

APPLIED MATERIALS INC

Method of controlling the film properties of PECVD-deposited thin films

Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow

Frequency monitoring to detect plasma process abnormality

Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors

Gas diffuser assembly

Diffuser gravity support

Plasma uniformity control by gas diffuser hole design

Barrier films for thin film encapsulation

Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surface

RF grounding of cathode in process chamber

Pecvd silicon oxide thin film deposition

Substrate support with quadrants

Plasma uniformity control by gas diffuser hole design

Prevention of film deposition on PECVD process chamber wall

Substrate support with quadrants

Plasma treatment on metal-oxide TFT

Reducing electrostatic charge by roughening the susceptor

Microcrystalline silicon thin film transistor

Method of avoiding haze formation on surfaces of silicon-containing PECVD-deposited thin films

Power loading substrates to reduce particle contamination

Gas confiner assembly for eliminating shadow frame

Plasma treatment on metal-oxide TFT

Corner spoiler for improving profile uniformity

Plasma treatment on metal-oxide TFT

SAMSUNG DISPLAY CO LTD

Display device

Display device and manufacturing method thereof

Display device and method of manufacturing the same

Display device

Display device and method of manufacturing the same

Light source member and display device having the same

Display device

Light emitting display device

CHOI SOO YOUNG

Plasma uniformity control by gas diffuser curvature

Particle reduction on surfaces of chemical vapor deposition processing apparatus

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Apparatus for depositing a uniform silicon film and methods for manufacturing the same

Anodized showerhead

WON TAE KYUNG

SiOx process chemistry development using microwave plasma CVD

Thin film deposition using microwave plasma

PARK BEOM SOO

Frequency monitoring to detect plasma process abnormality

KELLER ERNST

Diffuser gravity support

CHOI YOUNG JIN

Interface adhesion improvement method

BAEK JONGHOON

Off-center ground return for RF-powered showerhead

LEE JUNG HO

Image sensor and method of processing image data with multiple differential ramping up/down signals, and image processing device including the image sensor

FURUTA GAKU

a-Si seasoning effect to improve SiN run-to-run uniformity

WANG QUNHUA

Methods for depositing a silicon containing layer with argon gas dilution

KIM SAM H

Substrate support with gas introduction openings

WHITE JOHN M

Multi-gas flow diffuser

SAMSUNG ELECTRONICS CO LTD

Multistage amplifying circuit