Inventor
NAKAYAMA YASUHIKO
JP31 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA YASUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
13 patentsUS5774222AJun 30, 1998
Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected
HITACHI LTD167 citations99
US6169282B1Jan 2, 2001
Defect inspection method and apparatus therefor
HITACHI LTD107 citations98
US6091075AJul 18, 2000
Automatic focus detection method, automatic focus detection apparatus, and inspection apparatus
HITACHI LTD99 citations98
US5677755AOct 14, 1997
Method and apparatus for pattern exposure, mask used therefor, and semiconductor integrated circuit produced by using them
HITACHI LTD147 citations97
US6404498B1Jun 11, 2002
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected
HITACHI LTD38 citations96
US6263099B1Jul 17, 2001
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
HITACHI LTD56 citations96
US7221486B2May 22, 2007
Method and apparatus for picking up 2D image of an object to be sensed
HITACHI LTD33 citations93
US6674890B2Jan 6, 2004
Defect inspection method and apparatus therefor
HITACHI LTD41 citations93
US6507417B1Jan 14, 2003
Method and apparatus for picking up 2D image of an object to be sensed
HITACHI LTD23 citations93
US5747201AMay 5, 1998
Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method
HITACHI LTD28 citations92
US5409538AApr 25, 1995
Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method
HITACHI LTD26 citations92
US5134298AJul 28, 1992
Beam control method and apparatus
HITACHI LTD29 citations92
US5324953AJun 28, 1994
Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens
HITACHI LTD4 citations63
CHINON IND INC
8 patentsUSD302683SAug 8, 1989
Image information reading machine for electronic computer
CHINON IND INC36 citations87
USD306036SFeb 13, 1990
35 mm camera
CHINON IND INC7 citations74
USD285208SAug 19, 1986
35 mm Camera
CHINON IND INC8 citations74
USD284768SJul 22, 1986
35mm Camera
CHINON IND INC9 citations74
US4589747AMay 20, 1986
Electronic flash incorporated camera
CHINON IND INC22 citations74
USD327905SJul 14, 1992
Combined image copier and printer
CHINON IND INC14 citations69
USD306037SFeb 13, 1990
35 mm camera
CHINON IND INC5 citations63
US4140374AFeb 20, 1979
Overlap photographing device for sound cinecamera
CHINON IND INC0 citations42
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
4 patentsUS4745509AMay 17, 1988
Magnetic head with improved supporter for perpendicular magnetization recording
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21 citations82
US4672494AJun 9, 1987
Magnetic head for effecting perpendicular magnetic recording
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21 citations82
US4796134AJan 3, 1989
Magnetic head with improved supporter for perpendicular magnetization recording
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US4619720AOct 28, 1986
Magnetic amorphous alloys comprising Co, Fe, Zr, and Nb
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations48
RENESAS TECH CORP
3 patentsUS7061600B2Jun 13, 2006
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected
RENESAS TECH CORP11 citations93
US7180584B2Feb 20, 2007
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
RENESAS TECH CORP5 citations74
US7460220B2Dec 2, 2008
Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected
RENESAS TECH CORP2 citations63