Inventor

MCINTYRE GREGORY R

US23 patents

⚠️ This page may combine multiple inventors who share the name “MCINTYRE GREGORY R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MCINTYRE GREGORY R

CADENCE DESIGN SYSTEMS INC

System and method for analysis and transformation of layouts using situations

System and method for implementing image-based design rules

Fast pattern matching

Creating a situation repository

System and method for implementing image-based design rules

Design check database

Constraint plus pattern

Yield analysis with situations

IBM

Polarization monitoring reticle design for high numerical aperture lithography systems

Polarization monitoring reticle design for high numerical aperture lithography systems

Fabrication of on-product aberration monitors with nanomachining

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Mixed polarization state monitoring

GENNARI FRANK E

Fast pattern matching

Yield analysis with situations

System and method for implementing image-based design rules

System and method for implementing image-based design rules

GALLAGHER EMILY E

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Reducing edge die reflectivity in extreme ultraviolet lithography

UNIV CALIFORNIA

Phase-shifting test mask patterns for characterizing illumination polarization balance in image forming optical systems

Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems

HUANG WU-SONG

Method for enhancing lithographic imaging of isolated and semi-isolated features

MCINTYRE GREGORY R

Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution