Inventor
YAMAMURA MAYU
US16 patents
Patents
16 patentsUS10953515B2Mar 23, 2021
Apparatus and method of forming a polishing pads by use of an additive manufacturing process
APPLIED MATERIALS INC16 citations94
US10618141B2Apr 14, 2020
Apparatus for forming a polishing article that has a desired zeta potential
APPLIED MATERIALS INC18 citations94
US10456886B2Oct 29, 2019
Porous chemical mechanical polishing pads
APPLIED MATERIALS INC26 citations94
US10399201B2Sep 3, 2019
Advanced polishing pads having compositional gradients by use of an additive manufacturing process
APPLIED MATERIALS INC24 citations94
US10391605B2Aug 27, 2019
Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
APPLIED MATERIALS INC19 citations94
US10384330B2Aug 20, 2019
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC22 citations93
US10875145B2Dec 29, 2020
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC17 citations85
US10821573B2Nov 3, 2020
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC17 citations85
US10773509B2Sep 15, 2020
Pad structure and fabrication methods
APPLIED MATERIALS INC15 citations85
US11745302B2Sep 5, 2023
Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
APPLIED MATERIALS INC5 citations74
US11724362B2Aug 15, 2023
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC5 citations73
US11772229B2Oct 3, 2023
Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
APPLIED MATERIALS INC1 citations62
US11685014B2Jun 27, 2023
Formulations for advanced polishing pads
APPLIED MATERIALS INC1 citations61
US11072050B2Jul 27, 2021
Polishing pad with window and manufacturing methods thereof
APPLIED MATERIALS INC0 citations61
US11964359B2Apr 23, 2024
Apparatus and method of forming a polishing article that has a desired zeta potential
APPLIED MATERIALS INC1 citations59
US11813712B2Nov 14, 2023
Polishing pads having selectively arranged porosity
APPLIED MATERIALS INC0 citations44