Inventor
FUKASAWA MASATO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “FUKASAWA MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
7 patentsUS7838482B2Nov 23, 2010
CMP polishing compound and polishing method
HITACHI CHEMICAL CO LTD15 citations91
US7837800B2Nov 23, 2010
CMP polishing slurry and polishing method
HITACHI CHEMICAL CO LTD10 citations83
US4985328AJan 15, 1991
Dry toner, dry developer and process for forming electrophotographic images
HITACHI CHEMICAL CO LTD20 citations78
US9299573B2Mar 29, 2016
Polishing method
HITACHI CHEMICAL CO LTD4 citations70
US4954406ASep 4, 1990
Electrophotographic plate including an undercoating layer having a smooth surface
HITACHI CHEMICAL CO LTD6 citations60
US11046869B2Jun 29, 2021
Polishing liquid, polishing liquid set, and substrate polishing method
HITACHI CHEMICAL CO LTD0 citations58
US8901002B2Dec 2, 2014
Polishing slurry for metal films and polishing method
HITACHI CHEMICAL CO LTD0 citations51
FUKASAWA MASATO
4 patentsUS8168541B2May 1, 2012
CMP polishing slurry and polishing method
FUKASAWA MASATO2 citations60
US9293344B2Mar 22, 2016
Cmp polishing slurry and method of polishing substrate
FUKASAWA MASATO2 citations59
US8524111B2Sep 3, 2013
CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method
FUKASAWA MASATO1 citations49
US8900335B2Dec 2, 2014
CMP polishing slurry and method of polishing substrate
FUKASAWA MASATO0 citations39