Inventor
SHIMA MOTOYUKI
JP13 patents
⚠️ This page may combine multiple inventors who share the name “SHIMA MOTOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
9 patentsUS6800419B2Oct 5, 2004
Radiation-sensitive resin composition
JSR CORP14 citations82
US7144675B2Dec 5, 2006
Radiation-sensitive resin composition
JSR CORP7 citations70
US7078148B2Jul 18, 2006
Radiation sensitive resin composition
JSR CORP3 citations62
US8927200B2Jan 6, 2015
Double patterning method
JSR CORP3 citations57
US9926462B2Mar 27, 2018
Composition for forming liquid immersion upper layer film, and polymer
JSR CORP0 citations49
US9540535B2Jan 10, 2017
Composition for forming liquid immersion upper layer film, and polymer
JSR CORP0 citations49
US9817311B2Nov 14, 2017
Resist pattern-forming method, substrate-processing method, and photoresist composition
JSR CORP0 citations45
US9417527B2Aug 16, 2016
Resist pattern-forming method, substrate-processing method, and photoresist composition
JSR CORP0 citations45
US10023827B2Jul 17, 2018
Cleaning composition for semiconductor substrate and cleaning method
JSR CORP0 citations40
TOKYO ELECTRON LTD
3 patentsUS10272478B2Apr 30, 2019
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD7 citations83
US9818598B2Nov 14, 2017
Substrate cleaning method and recording medium
TOKYO ELECTRON LTD4 citations72
US10792711B2Oct 6, 2020
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD1 citations62