Inventor

DAVIS CECIL J

US89 patents

⚠️ This page may combine multiple inventors who share the name “DAVIS CECIL J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DAVIS CECIL J

TEXAS INSTRUMENTS INC

Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber

Multi-electrode plasma processing apparatus

Programmable multizone gas injector for single-wafer semiconductor processing equipment

High performance multi-zone illuminator module for semiconductor wafer processing

Multi zone illuminator with embeded process control sensors and light interference elimination circuit

Apparatus and method for in-situ deep ultraviolet photon-assisted semiconductor wafer processing

Remote plasma generation process using a two-stage showerhead

Processing apparatus and method

Method for etch of polysilicon film

Method for depositing compound from group II-VI

Method for etching an aluminum film doped with silicon

Method for cleanup processing chamber and vacuum process module

Apparatus for transferring workpieces

Processing apparatus and method

Processing apparatus and method

Vacuum processing system

Integrated circuit processing system

Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber

Method and apparatus for low-temperature semiconductor processing

Multi-zone illuminator with embedded process control sensors

Multi-electrode plasma processing apparatus

Processing method using both a remotely generated plasma and an in-situ plasma with UV irradiation

Wafer processing apparatus having independently controllable energy sources

Distributed-array magnetron-plasma processing module and method

Method for deposition of silicon oxide on a wafer

Plasma and plasma UV deposition of SiO2

Processing apparatus and method

Method for etching titanium nitride local interconnects

Method of sequential cleaning and passivating a GaAs substrate using remote oxygen plasma

Method and apparatus for cleaning integrated circuit wafers

Wafer processing apparatus and method

Method for plasma etching tungsten

Processing apparatus and method

Processing apparatus and method

Wafer processing apparatus

Processing apparatus

Semiconductor wafer heater with infrared lamp module with light blocking means

Integrated circuit processing system

Processing apparatus

Method for etching tungsten

Processing apparatus and method

Wafer processing apparatus

CVC PRODUCTS INC

Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure

Substrate edge seal and clamp for low-pressure processing equipment

Rapid cycle chuck for low-pressure processing

Edge sealing structure for substrate in low-pressure processing environment

Thin-film processing electromagnet for low-skew magnetic orientation

CVC INC

Physical vapor deposition system having reduced thickness backing plate

High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition

US ARMY

Low particulate reliability enhanced remote microwave plasma discharge device