Inventor

FUJISHIRO FELIX H

US4 patents

⚠️ This page may combine multiple inventors who share the name “FUJISHIRO FELIX H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VLSI TECHNOLOGY INC

3 patents

US5745990AMay 5, 1998

Titanium boride and titanium silicide contact barrier formation for integrated circuits

VLSI TECHNOLOGY INC48 citations90

US6007641ADec 28, 1999

Integrated-circuit manufacture method with aqueous hydrogen-fluoride and nitric-acid oxide etch

VLSI TECHNOLOGY INC9 citations72

US5493926AFeb 27, 1996

Method of identifying a weakest interface where delamination is most likely to occur in a multi-layer dielectric film stack

VLSI TECHNOLOGY INC7 citations65

KONINKL PHILIPS ELECTRONICS NV

1 patent

US6429144B1Aug 6, 2002

Integrated circuit manufacture method with aqueous hydrogen fluoride and nitric acid oxide etch

KONINKL PHILIPS ELECTRONICS NV17 citations82