Inventor
MEIER KURT
CH43 patents
⚠️ This page may combine multiple inventors who share the name “MEIER KURT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CIBA GEIGY CORP
28 patentsUS5432049AJul 11, 1995
Photochromic composition
CIBA GEIGY CORP160 citations98
US4624912ANov 25, 1986
Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images
CIBA GEIGY CORP152 citations98
US5073476ADec 17, 1991
Curable composition and the use thereof
CIBA GEIGY CORP126 citations96
US4992547AFeb 12, 1991
Aminoaryl ketone photoinitiators
CIBA GEIGY CORP77 citations96
US4868288ASep 19, 1989
Process for preparing metallocene complexes
CIBA GEIGY CORP69 citations96
US5079129AJan 7, 1992
Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
CIBA GEIGY CORP33 citations93
US4994346AFeb 19, 1991
Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
CIBA GEIGY CORP29 citations93
US5145885ASep 8, 1992
Photopolymerizable compositions containing aminoaryl ketone photoinitiators
CIBA GEIGY CORP48 citations92
US4855468AAug 8, 1989
Titanocenes and a radiation-polymerizable composition containing these titanocenes
CIBA GEIGY CORP24 citations92
US5011755AApr 30, 1991
Photoinitiator mixtures containing a titanocene and a 3-ketocoumarin
CIBA GEIGY CORP24 citations91
US5153101AOct 6, 1992
Photoresist
CIBA GEIGY CORP26 citations90
US4957946ASep 18, 1990
Cationically polymerizable mixtures containing metallocene complex salt of certain carboxylic or suffonic acids
CIBA GEIGY CORP27 citations90
US4484992ANov 27, 1984
Process for the production of hydrogen by means of heterogeneous photoredox catalysis
CIBA GEIGY CORP47 citations90
US4559237ADec 17, 1985
Process for the deposition of metals on semiconductor powders
CIBA GEIGY CORP20 citations81
US5494944AFeb 27, 1996
Hardenable composition and its use
CIBA GEIGY CORP10 citations74
US5371115ADec 6, 1994
Cationically polymerizable compositions containing iron metallolene salt
CIBA GEIGY CORP8 citations74
US5300380AApr 5, 1994
Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
CIBA GEIGY CORP15 citations74
US5310909AMay 10, 1994
Photochromic compounds, a process for their preparation, and their use
CIBA GEIGY CORP9 citations73
US5124233AJun 23, 1992
Photoresist compositions
CIBA GEIGY CORP15 citations73
US5073438ADec 17, 1991
Process for the preparation of laminates
CIBA GEIGY CORP6 citations73
US5047376ASep 10, 1991
Curing combination for cationically polymerizable materials
CIBA GEIGY CORP15 citations73
US4963300AOct 16, 1990
Process for the preparation of laminates
CIBA GEIGY CORP9 citations73
US5576399ANov 19, 1996
Epoxy acrylates
CIBA GEIGY CORP10 citations72
US4619838AOct 28, 1986
Process for the deposition of metals on semiconductor powders
CIBA GEIGY CORP8 citations72
US5565500AOct 15, 1996
Cationically polymerizable mixtures containing selected metallocene complex salts as curing agents
CIBA GEIGY CORP9 citations71
US5286611AFeb 15, 1994
Photoresist
CIBA GEIGY CORP6 citations71
US5082952AJan 21, 1992
Process for the preparation of metallocene complexes
CIBA GEIGY CORP3 citations63
US5371259ADec 6, 1994
Iron (II) metallocene salts
CIBA GEIGY CORP3 citations54
VANTICO INC
3 patentsSRG GLOBAL INC
3 patentsUS9828036B2Nov 28, 2017
Active grille shutter system with integrated radar
SRG GLOBAL INC19 citations89
US10137938B2Nov 27, 2018
Active grille shutter system with integrated radar
SRG GLOBAL INC5 citations80
US10093173B1Oct 9, 2018
Active grille shutter system with louver compensation feature
SRG GLOBAL INC15 citations76