P

Inventor

INA HIDEKI

JP114 patents
⚠️ This page may combine multiple inventors who share the name “INA HIDEKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

48 patents
US4814829AMar 21, 1989

Projection exposure apparatus

CANON KK162 citations98
US6636311B1Oct 21, 2003

Alignment method and exposure apparatus using the same

CANON KK63 citations96
US6151120ANov 21, 2000

Exposure apparatus and method

CANON KK74 citations96
US5659384AAug 19, 1997

Position detection apparatus and method

CANON KK68 citations96
US5309197AMay 3, 1994

Projection exposure apparatus

CANON KK76 citations96
US5148214ASep 15, 1992

Alignment and exposure apparatus

CANON KK80 citations96
US4952060AAug 28, 1990

Alignment method and a projection exposure apparatus using the same

CANON KK78 citations96
US4883359ANov 28, 1989

Alignment method and pattern forming method using the same

CANON KK57 citations96
US4861162AAug 29, 1989

Alignment of an object

CANON KK110 citations96
US4901109AFeb 13, 1990

Alignment and exposure apparatus

CANON KK58 citations95
US7794222B2Sep 14, 2010

Mold, pattern forming method, and pattern forming apparatus

CANON KK28 citations93
US7510388B2Mar 31, 2009

Mold, imprint method, and process for producing chip

CANON KK16 citations93
US6999893B2Feb 14, 2006

Position detecting device and position detecting method

CANON KK14 citations93
US6992767B2Jan 31, 2006

Management system, apparatus, and method, exposure apparatus, and control method therefor

CANON KK21 citations93
US6992780B2Jan 31, 2006

Position detecting method and apparatus, exposure apparatus and device manufacturing method

CANON KK26 citations93
US6906805B1Jun 14, 2005

Position detecting system and exposure apparatus using the same

CANON KK16 citations93
US6785583B2Aug 31, 2004

Management system and apparatus, method therefor, and device manufacturing method

CANON KK19 citations93
US6639677B1Oct 28, 2003

Position measuring method and position measuring system using the same

CANON KK27 citations93
US6563573B1May 13, 2003

Method of evaluating imaging performance

CANON KK44 citations93
US6559924B2May 6, 2003

Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory

CANON KK37 citations93
US6529625B2Mar 4, 2003

Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by using separate reference member having alignment marks

CANON KK30 citations93
US6266130B1Jul 24, 2001

Position detecting method and position detecting system

CANON KK28 citations93
US5323207AJun 21, 1994

Projection exposure apparatus

CANON KK34 citations93
US5160957ANov 3, 1992

Alignment and exposure apparatus

CANON KK52 citations93
US5133603AJul 28, 1992

Device for observing alignment marks on a mask and wafer

CANON KK48 citations93
US5048967ASep 17, 1991

Detection optical system for detecting a pattern on an object

CANON KK49 citations93
US4937459AJun 26, 1990

Alignment signal detecting device

CANON KK25 citations93
US4888614ADec 19, 1989

Observation system for a projection exposure apparatus

CANON KK24 citations93
US4886974ADec 12, 1989

Mark detecting device for detecting the center of a mark by detecting its edges

CANON KK33 citations93
US4669885AJun 2, 1987

Apparatus for inspecting negatives

CANON KK40 citations93
US4645924AFeb 24, 1987

Observation apparatus with selective light diffusion

CANON KK48 citations93
US4634240AJan 6, 1987

Optical apparatus using polarized light

CANON KK49 citations93
US6521889B1Feb 18, 2003

Dust particle inspection apparatus, and device manufacturing method using the same

CANON KK25 citations92
US6097472AAug 1, 2000

Apparatus and method for exposing a pattern on a ball-like device material

CANON KK28 citations92
US5137363AAug 11, 1992

Projection exposure apparatus

CANON KK37 citations92
US4834540AMay 30, 1989

Projection exposure apparatus

CANON KK44 citations92
US4669883AJun 2, 1987

Method and apparatus for alignment

CANON KK42 citations92
US6493065B2Dec 10, 2002

Alignment system and alignment method in exposure apparatus

CANON KK28 citations91
US5808724ASep 15, 1998

Illumination method and system having a first optical element at a position optically conjugate with an object and a second optical element closer to the object and on a pupil plane of the system

CANON KK23 citations91
US6980872B2Dec 27, 2005

Information providing method and system

CANON KK25 citations89
US9625836B2Apr 18, 2017

Interferometer, lithography apparatus, and method of manufacturing article

CANON KK10 citations84
US7884935B2Feb 8, 2011

Pattern transfer apparatus, imprint apparatus, and pattern transfer method

CANON KK12 citations84
US7771905B2Aug 10, 2010

Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method

CANON KK9 citations84
US7531821B2May 12, 2009

Imprint apparatus and imprint method including dual movable image pick-up device

CANON KK8 citations84
US7229566B2Jun 12, 2007

Position detecting method and apparatus

CANON KK15 citations84
US7173716B2Feb 6, 2007

Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices

CANON KK15 citations84
US7148973B2Dec 12, 2006

Position detecting method and apparatus, exposure apparatus and device manufacturing method

CANON KK12 citations84
US7103497B2Sep 5, 2006

Position detecting device and position detecting method

CANON KK12 citations84

SUEHIRA NOBUHITO

2 patents

Showing the top 50 of 114 patents by PatentIndex Score.