Inventor
SHIN INKYUN
KR15 patents
⚠️ This page may combine multiple inventors who share the name “SHIN INKYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SK ENPULSE CO LTD
9 patentsUS12455501B2Oct 28, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations59
US12529951B2Jan 20, 2026
Laminate for blank mask and manufacturing method for the same
SK ENPULSE CO LTD0 citations52
US12566369B2Mar 3, 2026
Method and apparatus for manufacturing a photomask from a blank mask
SK ENPULSE CO LTD0 citations49
US12529952B2Jan 20, 2026
Photomask blank and photomask using the same
SK ENPULSE CO LTD0 citations49
US12481212B2Nov 25, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations49
US12461438B2Nov 4, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations49
US12487517B2Dec 2, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations48
US12461439B2Nov 4, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations48
US12276905B2Apr 15, 2025
Blank mask and photomask using the same
SK ENPULSE CO LTD0 citations48
SAMSUNG ELECTRONICS CO LTD
6 patentsUS10056229B2Aug 21, 2018
Charged-particle beam exposure method and charged-particle beam correction method
SAMSUNG ELECTRONICS CO LTD2 citations68
US9766540B2Sep 19, 2017
Method of forming photomask
SAMSUNG ELECTRONICS CO LTD0 citations45
US9323142B2Apr 26, 2016
Methods of reducing registration errors of photomasks and photomasks formed using the methods
SAMSUNG ELECTRONICS CO LTD0 citations45
US9223199B2Dec 29, 2015
Photomask and method of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations45
US10007185B2Jun 26, 2018
Electron beam lithography method and apparatus
SAMSUNG ELECTRONICS CO LTD0 citations40
US9709893B2Jul 18, 2017
Exposure method using electron beam and substrate manufacturing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations35