Inventor
PONNEKANTI HARI
US20 patents
⚠️ This page may combine multiple inventors who share the name “PONNEKANTI HARI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
15 patentsUS6039834AMar 21, 2000
Apparatus and methods for upgraded substrate processing system with microwave plasma source
APPLIED MATERIALS INC242 citations99
US5844195ADec 1, 1998
Remote plasma source
APPLIED MATERIALS INC388 citations99
US6045618AApr 4, 2000
Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
APPLIED MATERIALS INC130 citations98
US6645303B2Nov 11, 2003
Heater/lift assembly for high temperature processing chamber
APPLIED MATERIALS INC75 citations97
US6361707B1Mar 26, 2002
Apparatus and methods for upgraded substrate processing system with microwave plasma source
APPLIED MATERIALS INC39 citations96
US6230652B1May 15, 2001
Apparatus and methods for upgraded substrate processing system with microwave plasma source
APPLIED MATERIALS INC43 citations96
US6354241B1Mar 12, 2002
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
APPLIED MATERIALS INC48 citations92
US8021527B2Sep 20, 2011
Coaxial shafts for radial positioning of rotating magnetron
APPLIED MATERIALS INC11 citations83
US6163007ADec 19, 2000
Microwave plasma generating apparatus with improved heat protection of sealing O-rings
APPLIED MATERIALS INC14 citations74
US11948783B2Apr 2, 2024
Dynamic phased array plasma source for complete plasma coverage of a moving substrate
APPLIED MATERIALS INC1 citations62
US11923172B2Mar 5, 2024
Paired dynamic parallel plate capacitively coupled plasmas
APPLIED MATERIALS INC0 citations62
US11713508B2Aug 1, 2023
Apparatus and methods for improving chemical utilization rate in deposition process
APPLIED MATERIALS INC0 citations62
US11631583B2Apr 18, 2023
RF power source operation in plasma enhanced processes
APPLIED MATERIALS INC0 citations62
US11396703B2Jul 26, 2022
Apparatus and methods for improving chemical utilization rate in deposition process
APPLIED MATERIALS INC0 citations62
US11282676B2Mar 22, 2022
Paired dynamic parallel plate capacitively coupled plasmas
APPLIED MATERIALS INC0 citations62