Inventor
SUBAWALLA HOSHANG
US5 patents
Patents
5 patentsUS7267727B2Sep 11, 2007
Processing of semiconductor components with dense processing fluids and ultrasonic energy
AIR PROD & CHEM21 citations92
US7581549B2Sep 1, 2009
Method for removing carbon-containing residues from a substrate
AIR PROD & CHEM18 citations83
US7195676B2Mar 27, 2007
Method for removal of flux and other residue in dense fluid systems
AIR PROD & CHEM12 citations81
US7074378B2Jul 11, 2006
Process for the purification of NF3
AIR PROD & CHEM4 citations61
US7211553B2May 1, 2007
Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols
AIR PROD & CHEM3 citations60