Inventor

SHIRAKAWA KOJI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “SHIRAKAWA KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIRAKAWA KOJI

FUJI PHOTO FILM CO LTD

Negative-working resist composition

Positive photoresist composition

Positive resist composition

Negative resist composition

Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture

Image forming method using strippable layer and light-sensitive polymerizable layer containing silver halide

Positive resist composition to be irradiated with one of an electron beam and X-ray

Image forming method using strippable layer and light-sensitive polymerizable layer containing silver halide

Negative-working resist composition for electron beams or x-rays

Negative resist composition

FUJIFILM CORP

Positive working resist composition

Negative resist composition

Positive resist composition

Positive resist composition and process for forming pattern using the same

Negative resist composition and pattern forming method using the same

TSUCHIMURA TOMOTAKA

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

TSUBAKI HIDEAKI

Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays

TSUCHIHASHI TORU

Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern

SHIRAKAWA KOJI

Positive resist composition

FUJIMORI TORU

Chemical amplification resist composition, and mold preparation method and resist film using the same