Inventor
FELSL HANS PETER
DE20 patents
⚠️ This page may combine multiple inventors who share the name “FELSL HANS PETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
10 patentsUS9166027B2Oct 20, 2015
IGBT with reduced feedback capacitance
INFINEON TECHNOLOGIES AG6 citations84
US7812427B2Oct 12, 2010
Soft switching semiconductor component with high robustness and low switching losses
INFINEON TECHNOLOGIES AG8 citations84
US7687891B2Mar 30, 2010
Diode having one or more zones of a first conductivity type and one or more zones of a second conductivity type each located within a layer of the second conductivity type
INFINEON TECHNOLOGIES AG8 citations84
US8853774B2Oct 7, 2014
Semiconductor device including trenches and method of manufacturing a semiconductor device
INFINEON TECHNOLOGIES AG14 citations81
US7915675B2Mar 29, 2011
IGBT having one or more stacked zones formed within a second layer of the IGBT
INFINEON TECHNOLOGIES AG2 citations62
US11018252B2May 25, 2021
Power semiconductor transistor
INFINEON TECHNOLOGIES AG0 citations59
US9741795B2Aug 22, 2017
IGBT having at least one first type transistor cell and reduced feedback capacitance
INFINEON TECHNOLOGIES AG0 citations52
US9048095B2Jun 2, 2015
Method for manufacturing a semiconductor device having a channel region in a trench
INFINEON TECHNOLOGIES AG0 citations52
US9385181B2Jul 5, 2016
Semiconductor diode and method of manufacturing a semiconductor diode
INFINEON TECHNOLOGIES AG0 citations51
US9293524B2Mar 22, 2016
Semiconductor device with a field ring edge termination structure and a separation trench arranged between different field rings
INFINEON TECHNOLOGIES AG0 citations36
INFINEON TECHNOLOGIES AUSTRIA
3 patentsUS7842590B2Nov 30, 2010
Method for manufacturing a semiconductor substrate including laser annealing
INFINEON TECHNOLOGIES AUSTRIA23 citations92
US9349829B2May 24, 2016
Method of manufacturing a multi-channel HEMT
INFINEON TECHNOLOGIES AUSTRIA1 citations52
US8872264B2Oct 28, 2014
Semiconductor device having a floating semiconductor zone
INFINEON TECHNOLOGIES AUSTRIA0 citations51