Inventor · disambiguated record
Tsuneaki Maesawa
Also filed as: MAESAWA TSUNEAKI
15 granted patents·5 pending applications·600 citations·filing 1997–2017
91Inventor score
Top patents by PatentIndex Score
20 records- 0197US7517990B2Method for deuteration of a heterocyclic ringWAKO PURE CHEM IND LTD·Filed 2003·Granted Apr 14, 2009·515 cites·5 claims
- 0289US7312014B2Resist compositionsWAKO PURE CHEM IND LTD·Filed 2002·Granted Dec 25, 2007·40 cites·24 claims
- 0385US10862127B2Binder for lithium cell, composition for producing electrode, and electrodeFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2017·Granted Dec 8, 2020·2 cites·13 claims
- 0485US6432608B1Resist compositionWAKO PURE CHEM IND LTD·Filed 2000·Granted Aug 13, 2002·23 cites·23 claims
- 0566US6716573B2Resist CompositionWAKO PURE CHEM IND LTD·Filed 2002·Granted Apr 6, 2004·7 cites·9 claims
- 0660US10044040B2Binder for lithium cell, composition for producing electrode, and electrodeWAKO PURE CHEM IND LTD·Filed 2013·Granted Aug 7, 2018·0 cites·22 claims
- 0758US8093422B2Method for deuteration of an aromatic ringITO NOBUHIRO·Filed 2003·Granted Jan 10, 2012·2 cites·6 claims
- 0856US9803161B2Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surfaceWAKO PURE CHEM IND LTD·Filed 2013·Granted Oct 31, 2017·1 cites·7 claims
- 0951US7101918B2Hybrid type onium saltWAKO PURE CHEM IND LTD·Filed 2002·Granted Sep 5, 2006·3 cites·32 claims
- 1045US2008071107A1Method for Deuterating Haloacrylic Acid or its SaltWAKO PURE CHEM IND LTD·Filed 2005·Application pending·0 cites
- 1143US7374857B2Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the compositionWAKO PURE CHEM IND LTD·Filed 2002·Granted May 20, 2008·0 cites·13 claims
- 1243US2008045724A1Deuterated Polyimides and Derivatives ThereofWAKO PURE CHEM IND LTD·Filed 2005·Application pending·0 cites
- 1342US9255070B2Method of deuteration using mixed catalystITO NOBUHIRO·Filed 2004·Granted Feb 9, 2016·0 cites·17 claims
- 1442US2016060584A1Cleaning agent for metal wiring substrate, and method for cleaning semiconductor substrateWAKO PURE CHEM IND LTD·Filed 2014·Application pending·0 cites
- 1541US7495122B2Heavy-hydrogenated norbornyl (meth)acrylates, process for producing them, polymers thereof and optical membersWAKO PURE CHEM IND LTD·Filed 2004·Granted Feb 24, 2009·0 cites·2 claims
- 1640US5854406AHigh molecular weight azoamide compoundWAKO PURE CHEM IND LTD·Filed 1997·Granted Dec 29, 1998·4 cites·8 claims
- 1740US2006281884A1Heavy-hydrogenated (meth) acrylates, proces for producing them, polymers thereof and optical membersSASAKI HIROKI·Filed 2004·Application pending·0 cites
- 1838US5973125AMacroazo compound, a process for its production, a macroazo initiator, and a process for its useWAKO PURE CHEM IND LTD·Filed 1998·Granted Oct 26, 1999·1 cites·18 claims
- 1938US2006116535A1Method of deuterationWAKO PURE CHEM IND LTD·Filed 2003·Application pending·0 cites
- 2034US5973094AFunctional polymersWAKO PURE CHEM IND LTD·Filed 1997·Granted Oct 26, 1999·2 cites·3 claims
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