P

Inventor

HESS CARL

US12 patents
⚠️ This page may combine multiple inventors who share the name “HESS CARL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HESS CARL

4 patents
US8151220B2Apr 3, 2012

Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data

HESS CARL9 citations82
US8810646B2Aug 19, 2014

Focus offset contamination inspection

HESS CARL1 citations49
US9208552B2Dec 8, 2015

Method and system for hybrid reticle inspection

HESS CARL0 citations44
US8914754B2Dec 16, 2014

Database-driven cell-to-cell reticle inspection

HESS CARL0 citations33

KLA TENCOR TECH CORP

2 patents
US7646906B2Jan 12, 2010

Computer-implemented methods for detecting defects in reticle design data

KLA TENCOR TECH CORP85 citations97
US7493590B1Feb 17, 2009

Process window optical proximity correction

KLA TENCOR TECH CORP17 citations82

KLA TENCOR TECH CORPORATION

2 patents
US10713771B2Jul 14, 2020

Methods and systems for inspection of wafers and reticles using designer intent data

KLA TENCOR TECH CORPORATION1 citations68
US11348222B2May 31, 2022

Methods and systems for inspection of wafers and reticles using designer intent data

KLA TENCOR TECH CORPORATION0 citations58

XIONG YALIN

1 patent
US8204297B1Jun 19, 2012

Methods and systems for classifying defects detected on a reticle

XIONG YALIN28 citations90

VERMA GAURAV

1 patent
US8102408B2Jan 24, 2012

Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs

VERMA GAURAV23 citations88

VOLK WILLIAM

1 patent
US9002497B2Apr 7, 2015

Methods and systems for inspection of wafers and reticles using designer intent data

VOLK WILLIAM14 citations86

FOUQUET CHRISTOPHE

1 patent
US9710903B2Jul 18, 2017

System and method for detecting design and process defects on a wafer using process monitoring features

FOUQUET CHRISTOPHE10 citations77