Inventor

LEE WAI MUN

US73 patents

⚠️ This page may combine multiple inventors who share the name “LEE WAI MUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE WAI MUN

EKC TECHNOLOGY INC

Method of removing etching residue

Cleaning compositions for removing etching residue and method of using

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Cleaning compositions for removing etching residue and method of using

Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent

Compositions for cleaning organic and plasma etched residues for semiconductor devices

Compositions and processes for photoresist stripping and residue removal in wafer level packaging

Alkanolamine semiconductor process residue removal composition and process

Post etch cleaning composition and process for dual damascene system

Alkanolamine semiconductor process residue removal process

Method of stripping resists from substrates using hydroxylamine and alkanolamine

Hydroxylamine-gallic compound composition and process

Hydroxylamine-gallic compound composition and process

Alkanolamine semiconductor process residue removal composition and process

Cleaning compositions for removing etching residue and method of using

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Semiconductor process residue removal composition and process

Compositions for cleaning organic and plasma etched residues for semiconductor devices

Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process

Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal process

Semiconductor process residue removal composition and process

Remover compositions for dual damascene system

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Semiconductor process residue removal composition and process

Post etch cleaning composition for dual damascene system

Cleaning compositions and methods of use thereof

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

MOTOROLA SOLUTIONS INC

Portable, wearable radio

System, method and device for wireless power transfer

Method and apparatus for touch control of information elements displayed on a communications device

Device and method for switching between message threads

Apparatus and method for expanded touch sensitive actuation of a user interface button

Apparatus and method for expanded touch sensitive actuation of a user interface button

Method and apparatus to reduce communication device peak current

System, method, and apparatus providing isolation for a high-speed communication interface with optimized signal integrity

Method and apparatus for forming a network

Device, system and method for transmitting one or more of annotations and video prior to a video call

Detection of unauthorized user assistance of an electronic device based on the detection of spoken words

Method and apparatus for displaying an image from a communications device

LEE WAI MUN

Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions

Composition and method for treating semiconductor substrate surface

Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid

Troika acid semiconductor cleaning compositions and methods of use

Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent

Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid

DELL PRODUCTS LP

Peripheral camera

Monitor with integrated camera

EKC TECHNOLOGY

Process using hydroxylamine-gallic acid composition

EKC TECHNOLOGIES INC

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

EKC DUPONT ELECTRONICS TECHNOL

Compositions and processes for photoresist stripping and residue removal in wafer level packaging