Inventor

SHRINIVASAN KRISHNAN

US20 patents

⚠️ This page may combine multiple inventors who share the name “SHRINIVASAN KRISHNAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHRINIVASAN KRISHNAN

NOVELLUS SYSTEMS INC

Apparatus and methods for processing semiconductor substrates using supercritical fluids

Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing

Cast pedestal with heating element and coaxial heat exchanger

Apparatus and methods for processing semiconductor substrates using supercritical fluids

Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species

Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials

Method and apparatus for removing post-etch residues and other adherent matrices

Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment

Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry

Pedestal heat transfer and temperature control

Method and apparatus for sealing substrate load port in a high pressure reactor

Method and apparatus for using surfactants in supercritical fluid processing of wafers

Systems for uniform heat transfer including adaptive portions

Multi-station sequential curing of dielectric films

SHRINIVASAN KRISHNAN

Multi-station sequential curing of dielectric films

Multi-station sequential curing of dielectric films

Single-chamber sequential curing of semiconductor wafers

GASONICS INTERNAT CORP

Method and apparatus for removing post-etch residues and other adherent matrices

HAVERKAMP JASON

Multi-station sequential curing of dielectric films

KELMAN MAXIM

Method for reducing stress in porous dielectric films