Inventor
CHOU SHUO-YEN
TW23 patents
⚠️ This page may combine multiple inventors who share the name “CHOU SHUO-YEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS10678142B2Jun 9, 2020
Optical proximity correction and photomasks
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations85
US11709435B2Jul 25, 2023
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11320747B2May 3, 2022
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10025175B2Jul 17, 2018
Method and system to prepare, manufacture and inspect mask patterns for a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9990460B2Jun 5, 2018
Source beam optimization method for improving lithography printability
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9747408B2Aug 29, 2017
Generating final mask pattern by performing inverse beam technology process
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US11789370B2Oct 17, 2023
Optical proximity correction and photomasks
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11243472B2Feb 8, 2022
Optical proximity correction and photomasks
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12265334B2Apr 1, 2025
Optical proximity correction and photomasks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12235589B2Feb 25, 2025
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10417376B2Sep 17, 2019
Source beam optimization method for improving lithography printability
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11211374B2Dec 28, 2021
Photomask design for generating plasmonic effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US9495507B2Nov 15, 2016
Method for integrated circuit mask patterning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations60
US10866525B2Dec 15, 2020
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10083270B2Sep 25, 2018
Target optimization method for improving lithography printability
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10685950B2Jun 16, 2020
Photomask design for generating plasmonic effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10698320B2Jun 30, 2020
Method for optimized wafer process simulation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10514613B2Dec 24, 2019
Pattern modification and patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40
TAIWAN SEMICONDUCTOR MFG
3 patentsUS8812999B2Aug 19, 2014
Method and system of mask data preparation for curvilinear mask patterns for a device
TAIWAN SEMICONDUCTOR MFG58 citations98
US8716841B1May 6, 2014
Photolithography mask and process
TAIWAN SEMICONDUCTOR MFG66 citations98
US9256709B2Feb 9, 2016
Method for integrated circuit mask patterning
TAIWAN SEMICONDUCTOR MFG545 citations97