Inventor

SUBRAMANIAN RAMKUMAR

US260 patents

⚠️ This page may combine multiple inventors who share the name “SUBRAMANIAN RAMKUMAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUBRAMANIAN RAMKUMAR

ADVANCED MICRO DEVICES INC

Chemical feature doubling process

Spin on polymers for organic memory devices

Monitor CMP process using scatterometry

Critical dimension monitoring from latent image

Bi-layer trim etch process to form integrated circuit gate structures

Use of silicon containing imaging layer to define sub-resolution gate structures

Chemical trim process

Developer soluble dyed BARC for dual damascene process

RELACS process to double the frequency or pitch of small feature formation

Systems and methods to determine seed layer thickness of trench sidewalls

Photosensitive polymeric memory elements

Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor

Polymer memory device formed in via opening

Methods of forming passive layers in organic memory cells

Scatterometry based measurements of a rotating substrate

Method(s) facilitating formation of memory cell(s) and patterned conductive

Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith

Carbon nanotubes as linewidth standards for SEM &amp; AFM

Super critical drying of low k materials

Using scatterometry to measure resist thickness and control implant

Use of carbon nanotubes to calibrate conventional tips used in AFM

Method for using a CVD organic barc as a hard mask during via etch

CVD plasma process to fill contact hole in damascene process

Antireflective siliconoxynitride hardmask layer used during etching processes in integrated circuit fabrication

Apparatus and method for reducing defects in a semiconductor lithographic process

Method for reducing defects in a semiconductor lithographic process

Post fabrication CD modification on imprint lithography mask

Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures

Use of supercritical fluid to dry wafer and clean lens in immersion lithography

System and method for imprint lithography to facilitate dual damascene integration with two imprint acts

Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication

Using supercritical fluids to clean lenses and monitor defects

Dual layer patterning scheme to make dual damascene

Scatterometry and acoustic based active control of thin film deposition process

Scatterometry monitor in cluster process tool environment for advanced process control (APC)

Damascene process for a T-shaped gate electrode

Refractive index system monitor and control for immersion lithography

Using scatterometry to detect and control undercut for ARC with developable BARCs

Artificial intelligence system for track defect problem solving

Photosensitive polymeric memory elements

System and method for active control of BPSG deposition

System and method to monitor reticle heating

Scatterometry of grating structures to monitor wafer stress

System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists

Method and system to monitor and control electro-static discharge

ADVANCED MICRO DEVICES LLP

Refractive index system monitor and control for immersion lithography

UNIV TEXAS

Positioning of nanoparticles and fabrication of single election devices

EDWARDS DAVID

Vehicle collision avoidance system

MICROSOFT CORP

Personalization of user accessibility options

COATS ROBERT MARTIN

Vehicle collision avoidance system

Carbon nanotubes as linewidth standards for SEM & AFM