Inventor

RANGARAJAN BHARATH

US190 patents

⚠️ This page may combine multiple inventors who share the name “RANGARAJAN BHARATH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RANGARAJAN BHARATH

ADVANCED MICRO DEVICES INC

Chemical feature doubling process

Monitor CMP process using scatterometry

Critical dimension monitoring from latent image

Process for fabricating a non-volatile memory device

Chemical trim process

Developer soluble dyed BARC for dual damascene process

Process for fabricating an ONO structure having a silicon-rich silicon nitride layer

Multiple nozzles for dispensing resist

Concurrent measurement of critical dimension and overlay in semiconductor manufacturing

Systems and methods to determine seed layer thickness of trench sidewalls

Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor

Reticle defect printability verification by resist latent image comparison

Scatterometry based measurements of a rotating substrate

Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith

Multi-pitch and line calibration for mask and wafer CD-SEM system

System and method for facilitating detection of defects on a wafer

Super critical drying of low k materials

Process for fabricating an ONO structure

Using scatterometry to measure resist thickness and control implant

Method for improving seed layer electroplating for semiconductor

Method to produce small space pattern using plasma polymerization layer

CVD plasma process to fill contact hole in damascene process

Dual layer patterning scheme to make dual damascene

Multi-layer overlay measurement and correction technique for IC manufacturing

Refractive index system monitor and control for immersion lithography

Artificial intelligence system for track defect problem solving

System and method to monitor reticle heating

High modulus filler for low k materials

Interlayer dielectric void detection

Scatterometry of grating structures to monitor wafer stress

System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists

Method and system to monitor and control electro-static discharge

Scatterometry based measurements of a moving substrate

Sensor to predict void free films using various grating structures and characterize fill performance

Growing a dual damascene structure using a copper seed layer and a damascene resist structure

Controlling thermal expansion of mask substrates by scatterometry

Treat resist surface to prevent pattern collapse

Use of scatterometry to measure pattern accuracy

Modification of mask layout data to improve mask fidelity

Using scatterometry to measure resist thickness and control implant

Wafer based temperature sensors for characterizing chemical mechanical polishing processes

Scattered signal collection using strobed technique

Use of multiple tips on AFM to deconvolve tip effects

Using localized ionizer to reduce electrostatic charge from wafer and mask

Conducting electron beam resist thin film layer for patterning of mask plates

Grainless material for calibration sample

UV-enhanced silylation process to increase etch resistance of ultra thin resists

Measure fluorescence from chemical released during trim etch

ADVANCED MICRO DEVICES LLP

Refractive index system monitor and control for immersion lithography

UNIV MICHIGAN STATE

Photopolymerizable compositions for encapsulating microelectronic devices