Inventor

PHAN KHOI A

US85 patents

⚠️ This page may combine multiple inventors who share the name “PHAN KHOI A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PHAN KHOI A

ADVANCED MICRO DEVICES INC

Monitor CMP process using scatterometry

Reticle defect printability verification by resist latent image comparison

System and method for facilitating detection of defects on a wafer

Apparatus and method for reducing defects in a semiconductor lithographic process

Method for reducing defects in a semiconductor lithographic process

Use of supercritical fluid to dry wafer and clean lens in immersion lithography

Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication

Using supercritical fluids to clean lenses and monitor defects

System and method for imprint lithography to facilitate dual damascene integration in a single imprint act

Barcode marking of wafer products for inventory control

Scatterometry monitor in cluster process tool environment for advanced process control (APC)

Multi-layer overlay measurement and correction technique for IC manufacturing

Refractive index system monitor and control for immersion lithography

Using scatterometry to detect and control undercut for ARC with developable BARCs

Electrical critical dimension measurement and defect detection for reticle fabrication

Artificial intelligence system for track defect problem solving

System and method to monitor reticle heating

Scatterometry of grating structures to monitor wafer stress

System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists

Method and system to monitor and control electro-static discharge

Sensor to predict void free films using various grating structures and characterize fill performance

Defect detection in pellicized reticles via exposure at short wavelengths

Controlling thermal expansion of mask substrates by scatterometry

Modification of mask layout data to improve mask fidelity

In-situ thickness measurement for use in semiconductor processing

Scattered signal collection using strobed technique

Using localized ionizer to reduce electrostatic charge from wafer and mask

Grainless material for calibration sample

UV-enhanced silylation process to increase etch resistance of ultra thin resists

Modification of mask layout data to improve mask fidelity

Nozzle arm movement for resist development

Nozzle arm movement for resist development

Low cost application of oxide test wafer for defect monitor in photolithography process

Resist developer saving system using material to reduce surface tension and wet resist surface

Real time immersion medium control using scatterometry

Use of base developers as immersion lithography fluid

Feedback control of imprint mask feature profile using scatterometry and spacer etchback

Optical monitoring and control of two layers of liquid immersion media

Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs

System and method for defect identification and location using an optical indicia device

Low defect metrology approach on clean track using integrated metrology

Parallel plate development

Electrostatic charge reduction of photoresist pattern on development track

Parallel inspection of semiconductor wafers by a plurality of different inspection stations to maximize throughput

System and method for imprint lithography to facilitate dual damascene integration in a single imprint act

Systems and methods of imprint lithography with adjustable mask

GLOBALFOUNDRIES INC

Mitigating heat in an integrated circuit

Recirculation and reuse of dummy dispensed resist

ADVANCED MICRO DEVICES LLP

Refractive index system monitor and control for immersion lithography

ADVANCE MICRO DEVICES INC

Re-circulation and reuse of dummy-dispensed resist