Inventor

YEDUR SANJAY K

US34 patents

⚠️ This page may combine multiple inventors who share the name “YEDUR SANJAY K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YEDUR SANJAY K

ADVANCED MICRO DEVICES INC

Multiple nozzles for dispensing resist

Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor

Carbon nanotubes as linewidth standards for SEM &amp; AFM

Use of carbon nanotubes as chemical sensors by incorporation of fluorescent molecules within the tube

Use of carbon nanotubes to calibrate conventional tips used in AFM

CVD plasma process to fill contact hole in damascene process

Use of multiple tips on AFM to deconvolve tip effects

Grainless material for calibration sample

UV-enhanced silylation process to increase etch resistance of ultra thin resists

Use of silicon oxynitride ARC for metal layers

Nozzle arm movement for resist development

Nozzle arm movement for resist development

Lithographic mask repair using a scanning tunneling microscope

Deposition of an oxide layer to facilitate photoresist rework on polygate layer

System for uniformly heating photoresist

Use of scanning probe microscope for defect detection and repair

Optimization of OPC design factors utilizing an advanced algorithm on a low voltage CD-SEM system

Multi-beam SEM for sidewall imaging

Self-cleaning technique for contamination on calibration sample in SEM

Nozzle arm movement for resist development

Carbon nanotube probes in atomic force microscope to detect partially open/closed contacts

Electron beam flood exposure technique to reduce the carbon contamination

Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM

Analysis of CD-SEM signal to detect scummed/closed contact holes and lines

Cleaning chamber built into SEM for plasma or gaseous phase cleaning

Method for detecting and identifying a lens aberration by measurement of sidewall angles by atomic force microscopy

Cantilever assembly and scanning tip therefor with associated optical sensor

Scanning probe microscope having optical fiber spaced from point of hp

Nozzle arm movement for resist development

System for facilitating uniform heating temperature of photoresist

Cleaning carbon contamination on mask using gaseous phase

Ozone cleaning of wafers

CVD plasma process to fill contact hole in damascene process

(unassigned)

Method for reducing surface reflectivity by increasing surface roughness

Carbon nanotubes as linewidth standards for SEM & AFM