Inventor
KUBOTA YOSHIHIRO
JP136 patents
⚠️ This page may combine multiple inventors who share the name “KUBOTA YOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
33 patentsUS5643483AJul 1, 1997
Ceramic heater made of fused silica glass having roughened surface
SHINETSU CHEMICAL CO69 citations96
US5382469AJan 17, 1995
Ceramic-titanium nitride electrostatic chuck
SHINETSU CHEMICAL CO67 citations96
US5324053AJun 28, 1994
Electrostatic chuck
SHINETSU CHEMICAL CO57 citations96
US6122159ASep 19, 2000
Electrostatic holding apparatus
SHINETSU CHEMICAL CO23 citations93
US5834143ANov 10, 1998
Frame-supported dustproof pellicle for photolithographic photomask
SHINETSU CHEMICAL CO26 citations93
US5607541AMar 4, 1997
Electrostatic chuck
SHINETSU CHEMICAL CO30 citations93
US5378514AJan 3, 1995
Frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO36 citations93
US5286567AFeb 15, 1994
Pellicle for photolithographic mask
SHINETSU CHEMICAL CO34 citations93
US6376977B1Apr 23, 2002
Silicon electrode plate
SHINETSU CHEMICAL CO27 citations92
US5693382ADec 2, 1997
Frame-supported pellicle for dustproof protection of photomask in photolithography
SHINETSU CHEMICAL CO36 citations92
US5691088ANov 25, 1997
Pellicle for protection of photolithographic mask
SHINETSU CHEMICAL CO26 citations92
US5616927AApr 1, 1997
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO30 citations92
US5209996AMay 11, 1993
Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same
SHINETSU CHEMICAL CO27 citations92
US5470621ANov 28, 1995
Frame-supported pellicle for dustproof protection of photomask
SHINETSU CHEMICAL CO34 citations91
US4395512AJul 26, 1983
Polyphenylenesulfide resin composition
SHINETSU CHEMICAL CO44 citations91
US8030176B2Oct 4, 2011
Method for preparing substrate having monocrystalline film
SHINETSU CHEMICAL CO10 citations84
US7855127B2Dec 21, 2010
Method for manufacturing semiconductor substrate
SHINETSU CHEMICAL CO12 citations84
US6509124B1Jan 21, 2003
Method of producing diamond film for lithography
SHINETSU CHEMICAL CO13 citations84
US5300348AApr 5, 1994
Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive
SHINETSU CHEMICAL CO20 citations84
US7951513B2May 31, 2011
Pellicle and method for producing pellicle
SHINETSU CHEMICAL CO16 citations83
US7901846B2Mar 8, 2011
Pellicle and method for manufacturing the same
SHINETSU CHEMICAL CO14 citations79
US5597669AJan 28, 1997
Frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO14 citations74
US5370951ADec 6, 1994
Frame-supported pellicle for protection of photolithographic mask
SHINETSU CHEMICAL CO16 citations74
US5327808AJul 12, 1994
Method for the preparation of a frame-supported pellicle for photolithography
SHINETSU CHEMICAL CO14 citations74
US5199055AMar 30, 1993
X-ray lithographic mask blank with reinforcement
SHINETSU CHEMICAL CO14 citations74
US5118573AJun 2, 1992
Magneto-optical recording medium
SHINETSU CHEMICAL CO10 citations74
US4734386AMar 29, 1988
Boron nitride dopant source for diffusion doping
SHINETSU CHEMICAL CO10 citations74
US10711373B2Jul 14, 2020
SiC composite substrate and method for manufacturing same
SHINETSU CHEMICAL CO2 citations73
US10612157B2Apr 7, 2020
Method for manufacturing SiC composite substrate, and method for manufacturing semiconductor substrate
SHINETSU CHEMICAL CO4 citations73
US11069560B2Jul 20, 2021
Method of transferring device layer to transfer substrate and highly thermal conductive substrate
SHINETSU CHEMICAL CO4 citations72
US9837301B2Dec 5, 2017
Method for producing hybrid substrates, and hybrid substrate
SHINETSU CHEMICAL CO5 citations72
US9741603B2Aug 22, 2017
Method for producing hybrid substrate, and hybrid substrate
SHINETSU CHEMICAL CO2 citations72
US9646873B2May 9, 2017
Method for producing SOS substrates, and SOS substrate
SHINETSU CHEMICAL CO2 citations72
FUJITSU LTD
9 patentsUS6333564B1Dec 25, 2001
Surface mount type semiconductor device and method of producing the same having an interposing layer electrically connecting the semiconductor chip with protrusion electrodes
FUJITSU LTD87 citations97
US6288444B1Sep 11, 2001
Semiconductor device and method of producing the same
FUJITSU LTD80 citations96
US5804468ASep 8, 1998
Process for manufacturing a packaged semiconductor having a divided leadframe stage
FUJITSU LTD65 citations96
US5497032AMar 5, 1996
Semiconductor device and lead frame therefore
FUJITSU LTD65 citations96
US6696754B2Feb 24, 2004
Semiconductor module including a plurality of semiconductor devices detachably
FUJITSU LTD20 citations92
US6472744B2Oct 29, 2002
Semiconductor module including a plurality of semiconductor devices detachably
FUJITSU LTD31 citations92
US5574904ANov 12, 1996
Database management system in an intelligent network using a common request data format
FUJITSU LTD43 citations92
US6560219B1May 6, 2003
Hybrid exchange, an exchange, and a re-arrangement method for STM data in an exchange
FUJITSU LTD34 citations91
US7693507B2Apr 6, 2010
Wireless network control device and wireless network control system
FUJITSU LTD20 citations83
AKIYAMA SHOJI
3 patentsUS8518612B2Aug 27, 2013
Pellicle for lithography and manufacturing method thereof
AKIYAMA SHOJI12 citations84
US8088670B2Jan 3, 2012
Method for manufacturing bonded substrate with sandblast treatment
AKIYAMA SHOJI9 citations84
US8263478B2Sep 11, 2012
Method for manufacturing semiconductor substrate
AKIYAMA SHOJI6 citations73
WATANABE HIROMASA
2 patentsNIPPON CHEMICAL IND
1 patentJAPAN CHEMICAL INNOVATION INST
1 patentKANO SHOJI
1 patentShowing the top 50 of 136 patents by PatentIndex Score.