Inventor
KUDO MUNEO
JP33 patents
⚠️ This page may combine multiple inventors who share the name “KUDO MUNEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
31 patentsUS6521290B1Feb 18, 2003
Silica particles surface-treated with silane, process for producing the same and uses thereof
SHINETSU CHEMICAL CO60 citations95
US6855759B2Feb 15, 2005
Silica particles surface-treated with silane, process for producing the same and uses thereof
SHINETSU CHEMICAL CO47 citations92
US6855768B2Feb 15, 2005
Coating composition, coating method, and coated article
SHINETSU CHEMICAL CO18 citations92
US6497964B1Dec 24, 2002
Coating compositions and method for the surface protection of plastic substrate
SHINETSU CHEMICAL CO36 citations92
US6335037B1Jan 1, 2002
Cosmetic comprising spherical hydrophobic fine silica particles
SHINETSU CHEMICAL CO25 citations92
US6316155B1Nov 13, 2001
External additive for electrostatically charged latent image developing toner
SHINETSU CHEMICAL CO27 citations91
US6166163ADec 26, 2000
Process for producing organosilicon resin and process for producing polyurethane foam by using the organosilicon resin obtained by that process
SHINETSU CHEMICAL CO19 citations91
US5840952ANov 24, 1998
Method of manufacturing 3-mercaptopropylalkoxy silane
SHINETSU CHEMICAL CO44 citations90
US7727635B2Jun 1, 2010
Abrasion-resistant coating composition and coated article
SHINETSU CHEMICAL CO9 citations84
US7226982B2Jun 5, 2007
Protective coat-forming coating composition, coated article, and multilayer laminate
SHINETSU CHEMICAL CO15 citations84
US6677047B2Jan 13, 2004
Coating composition, coating method, and coated article
SHINETSU CHEMICAL CO15 citations84
US7144628B2Dec 5, 2006
Spherical silica-titania-based fine particles surface-treated with silane, production process therefor, and external additive for electrostatically charged image developing toner using same
SHINETSU CHEMICAL CO8 citations74
US6124369ASep 26, 2000
Process for producing organosilicon resin, and process for producing polyurethane foam by using the organosilicon resin obtained by that process
SHINETSU CHEMICAL CO14 citations72
US7083888B2Aug 1, 2006
External additive for electrostatically charged image developing toner
SHINETSU CHEMICAL CO6 citations63
US6699956B2Mar 2, 2004
Highly dielectric addition type curable compositions
SHINETSU CHEMICAL CO5 citations63
US6656598B2Dec 2, 2003
Aqueous coating composition
SHINETSU CHEMICAL CO4 citations63
US5264601ANov 23, 1993
N,O-bis(trimethylsilyl) acetamide stabilization
SHINETSU CHEMICAL CO2 citations63
US5227504AJul 13, 1993
Trialkylsilylating agent and process for preparing N,N-disubstituted aminotrialkylsilane using the same
SHINETSU CHEMICAL CO3 citations63
US5466847ANov 14, 1995
Process for preparing hexamethylcyclotrisilazane
SHINETSU CHEMICAL CO3 citations61
US5245066ASep 14, 1993
Method for preparing hexamethylcyclotrisilazane
SHINETSU CHEMICAL CO4 citations61
US11840608B2Dec 12, 2023
Silicone and a method for preparing the same
SHINETSU CHEMICAL CO0 citations52
US11407862B2Aug 9, 2022
Silicone and a method for preparing the same
SHINETSU CHEMICAL CO0 citations52
US9567441B2Feb 14, 2017
Silicone and use thereof
SHINETSU CHEMICAL CO1 citations52
US9353135B2May 31, 2016
Silicone compound and a use thereof
SHINETSU CHEMICAL CO0 citations52
US9284339B2Mar 15, 2016
Silicone compound and a use thereof
SHINETSU CHEMICAL CO0 citations52
US9284338B2Mar 15, 2016
Silicone compound and a use thereof
SHINETSU CHEMICAL CO0 citations52
US9266985B2Feb 23, 2016
Silicone compound and a use thereof
SHINETSU CHEMICAL CO0 citations52
US9169275B2Oct 27, 2015
Organopolysiloxane and making method
SHINETSU CHEMICAL CO0 citations52
US5451693ASep 19, 1995
Tert-butyl cycloalkyl dialkoxysilane compounds and method for preparing same
SHINETSU CHEMICAL CO1 citations52
US5142080AAug 25, 1992
Method of manufacturing diethylaminotrimethylsilane
SHINETSU CHEMICAL CO1 citations52
US5136073AAug 4, 1992
Thexyl trialkoxy silane
SHINETSU CHEMICAL CO0 citations52