Inventor
KITANO TAKAHIRO
JP113 patents
⚠️ This page may combine multiple inventors who share the name “KITANO TAKAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
37 patentsUS6416583B1Jul 9, 2002
Film forming apparatus and film forming method
TOKYO ELECTRON LTD128 citations99
US6627263B2Sep 30, 2003
Film forming apparatus and film forming method
TOKYO ELECTRON LTD95 citations98
US6676757B2Jan 13, 2004
Coating film forming apparatus and coating unit
TOKYO ELECTRON LTD60 citations96
US6383948B1May 7, 2002
Coating film forming apparatus and coating film forming method
TOKYO ELECTRON LTD57 citations96
US6371667B1Apr 16, 2002
Film forming method and film forming apparatus
TOKYO ELECTRON LTD76 citations96
US5968268AOct 19, 1999
Coating apparatus and coating method
TOKYO ELECTRON LTD61 citations96
US6633022B2Oct 14, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD21 citations93
US6632281B2Oct 14, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD15 citations93
US6585430B2Jul 1, 2003
System and method for coating and developing
TOKYO ELECTRON LTD42 citations93
US6518199B2Feb 11, 2003
Method and system for coating and developing
TOKYO ELECTRON LTD31 citations93
US6200633B1Mar 13, 2001
Coating apparatus and coating method
TOKYO ELECTRON LTD42 citations93
US6059880AMay 9, 2000
Coating apparatus
TOKYO ELECTRON LTD56 citations93
US7797855B2Sep 21, 2010
Heating apparatus, and coating and developing apparatus
TOKYO ELECTRON LTD30 citations92
US6884294B2Apr 26, 2005
Coating film forming method and apparatus
TOKYO ELECTRON LTD16 citations92
US6872256B2Mar 29, 2005
Film forming unit
TOKYO ELECTRON LTD25 citations92
US6824616B2Nov 30, 2004
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD20 citations92
US6796054B2Sep 28, 2004
Low-pressure dryer and low-pressure drying method
TOKYO ELECTRON LTD30 citations92
US6776845B2Aug 17, 2004
Coating film forming method and system
TOKYO ELECTRON LTD16 citations92
US6695922B2Feb 24, 2004
Film forming unit
TOKYO ELECTRON LTD32 citations92
US6616760B2Sep 9, 2003
Film forming unit
TOKYO ELECTRON LTD28 citations92
US6605153B2Aug 12, 2003
Coating film forming apparatus
TOKYO ELECTRON LTD26 citations92
US6599366B1Jul 29, 2003
Substrate processing unit and processing method
TOKYO ELECTRON LTD32 citations92
US6537373B1Mar 25, 2003
Method of forming film and apparatus thereof
TOKYO ELECTRON LTD36 citations92
US6514344B2Feb 4, 2003
Film forming unit
TOKYO ELECTRON LTD28 citations92
US6811613B2Nov 2, 2004
Coating film forming apparatus
TOKYO ELECTRON LTD17 citations91
US6808566B2Oct 26, 2004
Reduced-pressure drying unit and coating film forming method
TOKYO ELECTRON LTD20 citations91
US6536964B1Mar 25, 2003
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD25 citations89
US7060939B2Jun 13, 2006
Substrate heating method, substrate heating system, and applying developing system
TOKYO ELECTRON LTD11 citations84
US6966949B2Nov 22, 2005
Apparatus and method for drying under reduced pressure, and coating film forming apparatus
TOKYO ELECTRON LTD12 citations84
US6875281B2Apr 5, 2005
Method and system for coating and developing
TOKYO ELECTRON LTD12 citations84
US6716478B2Apr 6, 2004
Coating film forming apparatus and coating film forming method
TOKYO ELECTRON LTD17 citations84
US6467976B2Oct 22, 2002
Coating and developing system
TOKYO ELECTRON LTD18 citations84
US6860945B2Mar 1, 2005
Substrate coating unit and substrate coating method
TOKYO ELECTRON LTD12 citations83
US6773510B2Aug 10, 2004
Substrate processing unit
TOKYO ELECTRON LTD17 citations83
US6761125B2Jul 13, 2004
Coating film forming system
TOKYO ELECTRON LTD14 citations82
US7024798B2Apr 11, 2006
Low-pressure dryer and low-pressure drying method
TOKYO ELECTRON LTD10 citations74
US6986214B2Jan 17, 2006
Low-pressure dryer and low-pressure drying method
TOKYO ELECTRON LTD9 citations74
NIPPON CATALYTIC CHEM IND
4 patentsUS7473470B2Jan 6, 2009
Particulate water absorbing agent with irregularly pulverized shape
NIPPON CATALYTIC CHEM IND34 citations92
US7435477B2Oct 14, 2008
Particulate water absorbent containing water absorbent resin as a main component
NIPPON CATALYTIC CHEM IND36 citations92
US7282262B2Oct 16, 2007
Particulate water absorbent containing water absorbent resin as a main component
NIPPON CATALYTIC CHEM IND34 citations92
US7960469B2Jun 14, 2011
Water absorbent resin composition and production method thereof
NIPPON CATALYTIC CHEM IND9 citations84
KITANO TAKAHIRO
3 patentsFUJI OIL CO LTD
1 patentTAKIGUCHI YASUSHI
1 patentKANEBO LTD
1 patentMIYAKE KOJI
1 patentIBIDEN COMPANY LTD
1 patentKYOCERA CORP
1 patentShowing the top 50 of 113 patents by PatentIndex Score.