Inventor
OHFUJI TAKESHI
JP7 patents
⚠️ This page may combine multiple inventors who share the name “OHFUJI TAKESHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
4 patentsUS5994025ANov 30, 1999
Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist
NEC CORP93 citations97
US5770346AJun 23, 1998
Photoresist and compounds for composing the photoresist
NEC CORP18 citations92
US5665518ASep 9, 1997
Photoresist and monomer and polymer for composing the photoresist
NEC CORP36 citations92
US5985522ANov 16, 1999
Photoresist and compounds for composing the photoresist
NEC CORP14 citations73
INTEL CORP
3 patentsUS6801295B2Oct 5, 2004
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP5 citations69
US7045260B2May 16, 2006
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP2 citations59
US7045259B2May 16, 2006
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP0 citations49