Inventor
INOMATA HIROYUKI
JP14 patents
⚠️ This page may combine multiple inventors who share the name “INOMATA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON SHEET GLASS CO LTD
7 patentsUS6576344B1Jun 10, 2003
Photocatalyst article, anti-fogging, anti-soiling articles, and production method of anti-fogging, anti-soiling articles
NIPPON SHEET GLASS CO LTD56 citations95
US6399212B1Jun 4, 2002
Silicon dioxide-coated polyolefin resin and process for its production
NIPPON SHEET GLASS CO LTD27 citations92
US6833089B1Dec 21, 2004
Article having photocatalytic activity
NIPPON SHEET GLASS CO LTD46 citations91
US6436542B1Aug 20, 2002
Multilayer structure and process for producing the same
NIPPON SHEET GLASS CO LTD38 citations91
US7289173B2Oct 30, 2007
Polarizing device, and method for manufacturing the same
NIPPON SHEET GLASS CO LTD11 citations82
US6913702B2Jul 5, 2005
Amorphous material processing method and glass substrate
NIPPON SHEET GLASS CO LTD9 citations74
US7727407B2Jun 1, 2010
Amorphous material processing method
NIPPON SHEET GLASS CO LTD2 citations63
DAINIPPON PRINTING CO LTD
4 patentsUS5397665AMar 14, 1995
Photomask with pellicle and method of treating and storing the same
DAINIPPON PRINTING CO LTD27 citations92
US5330053AJul 19, 1994
Case for photomask
DAINIPPON PRINTING CO LTD47 citations92
US5556724ASep 17, 1996
Phase shift photomask and method of producing same
DAINIPPON PRINTING CO LTD26 citations90
US7289657B2Oct 30, 2007
Method of inspecting photo-mask
DAINIPPON PRINTING CO LTD0 citations49
INTEL CORP
3 patentsUS6801295B2Oct 5, 2004
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP5 citations69
US7045260B2May 16, 2006
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP2 citations59
US7045259B2May 16, 2006
Post exposure modification of critical dimensions in mask fabrication
INTEL CORP0 citations49