Inventor

CHANG SHOU-SUNG

US70 patents

⚠️ This page may combine multiple inventors who share the name “CHANG SHOU-SUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHANG SHOU-SUNG

APPLIED MATERIALS INC

Method and apparatus for face-up substrate polishing

Pad assembly for electrochemical mechanical processing

Pad assembly for electrochemical mechanical polishing

Pad assembly for electrochemical mechanical processing

Steam treatment stations for chemical mechanical polishing system

Multi-layer polishing pad

Pad conditioning device with flexible media mount

Pad assembly for electrochemical mechanical processing

Apparatus and methods for conditioning a polishing pad

Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing

Pad assembly for electrochemical mechanical processing

Polishing system with annular platen or polishing pad for substrate monitoring

Orbital polishing with small pad

Polishing system with front side pressure control

Use of steam for pre-heating of CMP components

Polishing pad cleaning systems employing fluid outlets oriented to direct fluid under spray bodies and towards inlet ports, and related methods

Vacuum cleaning systems for polishing pads, and related methods

Temperature control of chemical mechanical polishing

Slurry distribution device for chemical mechanical polishing

Slurry distribution device for chemical mechanical polishing

Multi-disk chemical mechanical polishing pad conditioners and methods

Apparatus and method for CMP temperature control

Polishing system with annular platen or polishing pad

Polishing system with support post and annular platen or polishing pad

Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing

Steam treatment stations for chemical mechanical polishing system

Method for CMP temperature control

Apparatus and method for CMP temperature control

Apparatus and method for CMP temperature control

Steam treatment stations for chemical mechanical polishing system

Apparatus and method for CMP temperature control

Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity

Temperature-based in-situ edge assymetry correction during CMP

Chemical mechanical polishing temperature scanning apparatus for temperature control

Steam cleaning of CMP components

Grounding techniques for ESD polymeric fluid lines

APLEX INC

Temperature regulation in a CMP process

Conditioner assembly for a chemical mechanical polishing apparatus

Polishing head for a chemical mechanical polishing apparatus

CHANG SHOU-SUNG

Closed loop control of pad profile based on metrology feedback

Systems and methods for substrate polishing end point detection using improved friction measurement

Systems and methods for substrate polishing end point detection using improved friction measurement

APLEX GROUP

Polishing tool having a sealed fluid chamber for support of polishing pad

Wafer carrier head with inflatable bladder and attack angle control for polishing

DHANDAPANI SIVAKUMAR

Closed-loop control for improved polishing pad profiles

MOSEL VITELIC INC

Polishing pad shaping and patterning

DUBOUST ALAIN

Multi-layer polishing pad for low-pressure polishing

DESHPANDE SAMEER

In-situ performance prediction of pad conditioning disk by closed loop torque monitoring

KOLLATA EASHWER

Methods and apparatus for removal of films and flakes from the edge of both sides of a substrate using backing pads

CHEN HUNG CHIH

Polishing pad conditioner